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1. (WO2017185569) METHOD OF CLEARING MEMORY, DEVICE, AND ELECTRONIC APPARATUS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/185569    International Application No.:    PCT/CN2016/095983
Publication Date: 02.11.2017 International Filing Date: 19.08.2016
IPC:
G06F 9/445 (2006.01)
Applicants: BEIJING XIAOMI MOBILE SOFTWARE CO., LTD. [CN/CN]; Room 01, Floor 9, Rainbow City Shopping MallⅡof China Resources, No. 68, Qinghe Middle Street, Haidian District Beijing 100085 (CN)
Inventors: ZHANG, Xiaoliang; (CN).
YAN, Hao; (CN).
LIU, Ren; (CN)
Agent: CHINA PAT INTELLECTUAL PROPERTY OFFICE; 2nd Floor, Zhongguancun Intellectual Property Building, Block B, No. 21 Haidian South Road, Haidian Beijing 100080 (CN)
Priority Data:
201610282786.X 29.04.2016 CN
Title (EN) METHOD OF CLEARING MEMORY, DEVICE, AND ELECTRONIC APPARATUS
(FR) PROCÉDÉ D'EFFACEMENT DE MÉMOIRE, DISPOSITIF, ET APPAREIL ÉLECTRONIQUE
(ZH) 内存清理方法及装置、电子设备
Abstract: front page image
(EN)A method of clearing memory, a device, and an electronic apparatus. The method comprises: determining a preconfigured level corresponding to a detected lagging state (S101); determining a clearing mode corresponding to the preconfigured level (S102); and clearing, according to the clearing mode, an operating application in memory (S103).
(FR)L'invention concerne un procédé d'effacement de mémoire, un dispositif, et un appareil électronique. Le procédé consiste à : déterminer un niveau préconfiguré correspondant à un état de retard détecté (S101) ; déterminer un mode d'effacement correspondant au niveau préconfiguré (S102) ; et effacer, en fonction du mode d'effacement, une application en cours de fonctionnement dans la mémoire (S103).
(ZH)一种内存清理方法及装置、电子设备。所述方法包括:确定检测到的卡顿状态对应的预设级别(S101);确定与所述预设级别相对应的清理模式(S102);根据所述清理模式对内存中运行的应用程序进行清理(S103)。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)