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1. (WO2017183342) SILICON-CONTAINING SULFURIC ACID ESTER SALT
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/183342 International Application No.: PCT/JP2017/009018
Publication Date: 26.10.2017 International Filing Date: 07.03.2017
IPC:
C07F 7/08 (2006.01) ,C07F 9/54 (2006.01)
Applicants: NISSHINBO HOLDINGS INC.[JP/JP]; 2-31-11, Nihonbashi Ningyo-cho, Chuo-ku, Tokyo 1038650, JP
Inventors: MASUDA Gen; JP
Agent: PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE; GINZA OHTSUKA Bldg. 2F, 16-12, Ginza 2-chome, Chuo-ku, Tokyo 1040061, JP
Priority Data:
2016-08507721.04.2016JP
Title (EN) SILICON-CONTAINING SULFURIC ACID ESTER SALT
(FR) SEL D'ESTER D'ACIDE SULFURIQUE CONTENANT DU SILICIUM
(JA) ケイ素含有硫酸エステル塩
Abstract: front page image
(EN) Provided is a silicon-containing sulfuric acid ester salt comprising a silicon-containing sulfuric acid ester anion represented by formula (1) and a cation selected from cations respectively represented by formulae (2) to (5).
(FR) L'invention concerne un sel d'ester d'acide sulfurique contenant du silicium, qui comprend un anion ester d'acide sulfurique contenant du silicium représenté par la formule (1) et un cation choisi parmi les cations représentés respectivement par les formules (2) à (5).
(JA) 下記式(1)で表されるケイ素含有硫酸エステルアニオン、及び下記式(2)~(5)で表されるものから選ばれるいずれかのカチオンからなるケイ素含有硫酸エステル塩を提供する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)