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1. (WO2017183314) BxNyCzOw FILM, METHOD FOR FORMING FILM, MAGNETIC RECORDING MEDIUM, AND METHOD FOR MANUFACTURING SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/183314    International Application No.:    PCT/JP2017/007858
Publication Date: 26.10.2017 International Filing Date: 28.02.2017
IPC:
G11B 5/72 (2006.01), G11B 5/725 (2006.01), G11B 5/84 (2006.01)
Applicants: YOUTEC CO., LTD. [JP/JP]; 956-1, Nishi-hirai, Nagareyama-shi, Chiba 2700156 (JP)
Inventors: ABE Koji; (JP).
WATANABE Toshiyukii; (JP).
SEKINO Hiroyasu; (JP)
Agent: YANASE Mutsuyasu; (JP).
WATANABE Atsushi; (JP)
Priority Data:
2016-084510 20.04.2016 JP
Title (EN) BxNyCzOw FILM, METHOD FOR FORMING FILM, MAGNETIC RECORDING MEDIUM, AND METHOD FOR MANUFACTURING SAME
(FR) FILM DE BxNyCzOw, PROCÉDÉ DE FORMATION DE FILM, SUPPORT D'ENREGISTREMENT MAGNÉTIQUE, ET SON PROCÉDÉ DE FABRICATION
(JA) BxNyCzOw膜、成膜方法、磁気記録媒体およびその製造方法
Abstract: front page image
(EN)[Problem] To provide a BxNyCzOw film having a surface having a water contact angle of 50 ° or less. [Solution] One embodiment of the present invention is a BxNyCzOw film formed on a substrate, wherein x, y, z, and w in the BxNyCzOw film satisfy equations (1)-(5) below. (1) 0.4 < x < 0.6 (2) 0.4 < y < 0.6 (3) 0 ≤ z < 0.1 (4) 0 ≤ w < 0.1 (5) x + y + z + w = 1
(FR)Le problème décrit par la présente invention vise à fournir un film de BxNyCzOw ayant une surface ayant un angle de contact d'eau de 50° ou moins. La solution décrite par la présente invention concerne un film de BxNyCzOw formé sur un substrat, où x, y, z et w dans le film de BxNyCzOw satisfont les équations (1)-(5) ci-dessous. (1) 0,4 < x < 0,6; (2) 0,4 < y < 0,6; (3) 0 ≤ z < 0,1; (4) 0 ≤ w < 0,1; (5) x + y + z + w = 1
(JA)【課題】水の接触角が50°以下の表面を有するB膜を提供する。 【解決手段】本発明の一態様は、基板上に成膜されたB膜14であって、x,y,z,wは下記式(1)~(5)を満たすB膜である。 (1)0.4<x<0.6 (2)0.4<y<0.6 (3)0≦z<0.1 (4)0≦w<0.1 (5)x+y+z+w=1
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)