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1. (WO2017183313) GAS SUPPLY DEVICE, FILM FORMATION DEVICE, GAS SUPPLY METHOD, PRODUCTION METHOD FOR CARBON FILM, AND MANUFACTURING METHOD FOR MAGNETIC RECORDING MEDIUM
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Pub. No.: WO/2017/183313 International Application No.: PCT/JP2017/007857
Publication Date: 26.10.2017 International Filing Date: 28.02.2017
IPC:
C23C 16/448 (2006.01) ,C23C 16/26 (2006.01) ,C23C 16/32 (2006.01) ,C23C 16/509 (2006.01) ,G11B 5/72 (2006.01) ,G11B 5/725 (2006.01) ,G11B 5/84 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
448
characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
26
Deposition of carbon only
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
32
Carbides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
50
using electric discharges
505
using radio frequency discharges
509
using internal electrodes
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
62
Record carriers characterised by the selection of the material
72
Protective coatings, e.g. anti-static
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
62
Record carriers characterised by the selection of the material
72
Protective coatings, e.g. anti-static
725
containing a lubricant
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
Applicants: ADVANCED MATERIAL TECHNOLOGIES, INC.[JP/JP]; 956-1, Nishi-hirai, Nagareyama-shi, Chiba 2700156, JP
Inventors: KAWABE Takeharu; JP
TAKANO Kenichi; JP
SEKINO Hiroyasu; JP
ABE Koji; JP
Agent: YANASE Mutsuyasu; JP
WATANABE Atsushi; JP
Priority Data:
2016-08635622.04.2016JP
Title (EN) GAS SUPPLY DEVICE, FILM FORMATION DEVICE, GAS SUPPLY METHOD, PRODUCTION METHOD FOR CARBON FILM, AND MANUFACTURING METHOD FOR MAGNETIC RECORDING MEDIUM
(FR) DISPOSITIF D'ALIMENTATION EN GAZ, DISPOSITIF DE FORMATION DE FILM, PROCÉDÉ D'ALIMENTATION EN GAZ, PROCÉDÉ DE PRODUCTION DE FILM DE CARBONE ET PROCÉDÉ DE FABRICATION DE SUPPORT D'ENREGISTREMENT MAGNÉTIQUE
(JA) ガス供給装置、成膜装置、ガス供給方法、炭素膜の作製方法及び磁気記録媒体の製造方法
Abstract:
(EN) [Problem] To provide a gas supply device that supplies to a vacuum chamber a sublimable solid organic compound with a large molecular weight. [Solution] One aspect of the present invention is a gas supply device that supplies gas to a vacuum chamber 21, and that is provided with the following: a container 16 that is connected to the vacuum chamber via a first pipe 19; a heating mechanism 20 that heats the container; a sublimable solid organic compound 17 stored in the container; and a carrier gas supply source 11 that is connected to the container via a second pipe 18.
(FR) Le problème décrit par la présente invention est de fournir un dispositif d'alimentation en gaz qui fournit, dans une chambre à vide, un composé organique solide sublimable ayant un poids moléculaire élevé. La solution selon l'invention consiste, dans un de ses aspects, en un dispositif d'alimentation en gaz qui fournit du gaz à une chambre à vide 21, et qui comporte les éléments suivants : un récipient 16 qui est relié à la chambre à vide par l'intermédiaire d'un premier tuyau 19; un mécanisme de chauffage 20 qui chauffe le récipient; un composé organique solide sublimable 17 stocké dans le récipient; et une source d'alimentation en gaz porteur 11 qui est reliée au récipient par l'intermédiaire d'un second tuyau 18.
(JA) 【課題】分子量の大きい固体の昇華性の有機化合物を真空チャンバー内に供給するガス供給装置を提供する。 【解決手段】本発明の一態様は、真空チャンバー21にガスを供給するガス供給装置であって、前記真空チャンバーに第1の配管19によって接続された容器16と、前記容器を加熱する加熱機構20と、前記容器内に収容された固体の昇華性の有機化合物17と、前記容器に第2の配管18によって接続されたキャリアガス供給源11と、を具備するガス供給装置である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)