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1. (WO2017182558) METHOD FOR DETECTING THE POSITION OF A MASK HOLDER ON A MEASURING TABLE
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Pub. No.: WO/2017/182558 International Application No.: PCT/EP2017/059370
Publication Date: 26.10.2017 International Filing Date: 20.04.2017
IPC:
G03F 7/20 (2006.01) ,G01B 11/03 (2006.01) ,G03F 1/84 (2012.01) ,H01L 21/67 (2006.01) ,G01N 21/956 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
02
for measuring length, width, or thickness
03
by measuring coordinates of points
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68
Preparation processes not covered by groups G03F1/20-G03F1/5096
82
Auxiliary processes, e.g. cleaning
84
Inspecting
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
95
characterised by the material or shape of the object to be examined
956
Inspecting patterns on the surface of objects
Applicants: CARL ZEISS SMT GMBH[DE/DE]; Rudolf-Eber-Straße 2 73447 Oberkochen BW, DE
Inventors: SOLOWAN, Hans-Michael; DE
Agent: RAUNECKER, Klaus, Peter; DE
Priority Data:
10 2016 107 524.822.04.2016DE
Title (EN) METHOD FOR DETECTING THE POSITION OF A MASK HOLDER ON A MEASURING TABLE
(FR) PROCÉDÉ DE DÉTECTION DE POSITION D'UN SUPPORT DE MASQUE SUR UN PLAN DE MESURE
(DE) VERFAHREN ZUR POSITIONSERFASSUNG EINES MASKENHALTERS AUF EINEM MESSTISCH
Abstract:
(EN) The invention relates to a method for detecting the position of a mask holder (1) for masks (2) for photolithography, comprising the following steps: Positioning the mask holder (1) with masks (2) on a measuring table of a measuring device; measuring the mask holder (1) by means of an algorithm; recording the absolute position of the mask holder (1) on the measuring table and capturing and recording at least one reference image.
(FR) L'invention concerne un procédé de détection de position d'un support (1) de masque pour des masques (2) destinés à la photolithographie, consistant : à positionner le support (1) de masque avec un masque (2) sur un plan de mesure d'un dispositif de mesure; à soumettre le support (1) de masque à une mesure au moyen d'un algorithme, à enregistrer la position absolue du support (1) de masque sur le plan de mesure, et à recevoir et enregistrer au moins une image de référence.
(DE) Die Erfindung betritt ein Verfahren zur Positionserfassung eines Maskenhalters (1) für Masken (2) für die Photolithographie, mit den folgenden Schritten: - Positionierung des Maskenhalters (1) mit Maske (2) auf einem Messtisch einer Messvorrichtung - Anmessen des Maskenhalters (1) mittels eines Algorithmus - Speicherung der Absolutposition des Maskenhalters (1) auf dem Messtisch - Aufnahme und Speicherung mindestens eines Referenzbildes.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)