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1. (WO2017182441) POSITIVE WORKING PHOTOSENSITIVE MATERIAL
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/182441    International Application No.:    PCT/EP2017/059128
Publication Date: 26.10.2017 International Filing Date: 18.04.2017
IPC:
G03F 7/004 (2006.01), G03F 7/039 (2006.01)
Applicants: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À.R.L. [LU/LU]; Société à responsabilité limitée 46 Place Guillaume II 1648 Luxembourg (LU)
Inventors: LIU, Weihong; (US).
LU, PingHung; (US).
CHEN, Chunwei; (US).
LAI, SookMee; (US).
SAKURAI, Yoshiaru; (JP).
HISHIDA, Aritaka; (JP)
Agent: FÉAUX DE LACROIX, Stefan; (DE)
Priority Data:
62/324,779 19.04.2016 US
Title (EN) POSITIVE WORKING PHOTOSENSITIVE MATERIAL
(FR) MATÉRIAU PHOTOSENSIBLE POSITIF
Abstract: front page image
(EN)The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.
(FR)La présente invention concerne une composition photosensible positive sensible à la lumière, qui est particulièrement utile pour l'imagerie de films épais à l'aide d'une composition offrant une très bonne uniformité de film et favorisant une bonne latitude de processus contre l'effondrement de motifs caractéristiques dans des motifs créés lors de l'imagerie et du développement de ces films.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)