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1. (WO2017180651) MULTISTAGE ARRANGEMENT HAVING REDUCED DISPERSION
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/180651    International Application No.:    PCT/US2017/027050
Publication Date: 19.10.2017 International Filing Date: 11.04.2017
Chapter 2 Demand Filed:    17.01.2018    
IPC:
H03H 11/16 (2006.01), H04B 1/18 (2006.01), H03H 7/40 (2006.01)
Applicants: SNAPTRACK, INC. [US/US]; ATTN: International IP Administration 5775 Morehouse Drive San Diego, CA 92121-1714 (US)
Inventors: DETLEFSEN, Andreas; (US).
ESQUIUS MOROTE, Marc; (US)
Agent: ROBERTS, Steven, E.; (US).
HAMMACK, Marcus, W.; (US).
READ, Randol, W.; (US)
Priority Data:
10 2016 106 611.7 11.04.2016 DE
Title (EN) MULTISTAGE ARRANGEMENT HAVING REDUCED DISPERSION
(FR) AGENCEMENT À ÉTAGES MULTIPLES À DISPERSION RÉDUITE
Abstract: front page image
(EN)To compensate the negative effect of a parasitic impedance element in a two-stage arrangement of a first and a second electric component a compensation element is inserted between first and second stage to supplement the parasitic impedance elements to yield a phase shifter.
(FR)Pour compenser l'effet négatif d'un élément d'impédance parasite dans un agencement à deux étages d'un premier et d'un second composant électrique, un élément de compensation est inséré entre le premier et le second étage pour compléter les éléments d'impédance parasite en vue de produire un déphaseur.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)