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1. (WO2017180293) AQUEOUS SOLUTION AND PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES
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Pub. No.: WO/2017/180293 International Application No.: PCT/US2017/023301
Publication Date: 19.10.2017 International Filing Date: 21.03.2017
IPC:
G03F 7/42 (2006.01) ,C11D 1/04 (2006.01) ,C11D 1/08 (2006.01) ,C11D 1/10 (2006.01) ,C11D 1/40 (2006.01) ,C11D 1/42 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
42
Stripping or agents therefor
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
1
Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
02
Anionic compounds
04
Carboxylic acids or salts thereof
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
1
Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
02
Anionic compounds
04
Carboxylic acids or salts thereof
08
Polycarboxylic acids containing no nitrogen or sulfur
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
1
Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
02
Anionic compounds
04
Carboxylic acids or salts thereof
10
Amino carboxylic acids; Imino carboxylic acids; Fatty acid condensates thereof
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
1
Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
38
Cationic compounds
40
Monoamines or polyamines; Salts thereof
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
1
Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
38
Cationic compounds
42
Amino alcohols or amino ethers
Applicants:
VERSUM MATERIALS US, LLC [US/US]; 8555 S. River Parkway Tempe, Arizona 85284, US
Inventors:
PETERS, Richard, Dalton; US
ACRA, Travis, W.; US
POLLARD, Kimberly, Dona; US
Agent:
ROSSI, Joseph, D.; US
Priority Data:
15/096,36212.04.2016US
Title (EN) AQUEOUS SOLUTION AND PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES
(FR) SOLUTION AQUEUSE ET PROCÉDÉ D'ÉLIMINATION DE SUBSTANCES DE SUBSTRATS
Abstract:
(EN) The disclosure is directed solutions and processes to remove substances from substrates. In some cases, the substances can include photoresist on semiconductor wafers. The solution can include a quaternary ammonium hydroxide an amine, and optionally a corrosion inhibitor and /or a sugar alcohol. One or more sides of the substrate can be contacted with the solution to remove one or more substances from the substrate.
(FR) L'invention concerne des solutions et des procédés d'élimination de substances de substrats. Dans certains cas, les substances peuvent comprendre une photorésine sur des plaquettes semi-conductrices. La solution peut comprendre un hydroxyde d'ammonium quaternaire, une amine, et éventuellement un inhibiteur de corrosion et/ou un alcool de sucre. Un ou plusieurs côtés du substrat peuvent être mis en contact avec la solution pour éliminer une ou plusieurs substances du substrat.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)