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1. (WO2017179955) METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURE USING NANOIMPRINT METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/179955    International Application No.:    PCT/KR2017/004082
Publication Date: 19.10.2017 International Filing Date: 14.04.2017
IPC:
G03F 7/00 (2006.01), G03F 7/20 (2006.01), G03F 9/00 (2006.01)
Applicants: KOREA INSTITUTE OF MACHINERY & MATERIALS [KR/KR]; 156 Gajeongbuk-Ro Yuseong-Gu Daejeon 34103 (KR)
Inventors: JEONG, Jun-ho; (KR).
JEON, So Hee; (KR).
CHOI, Junhyuk; (KR).
CHOI, Dae-Guen; (KR).
LEE, Ji Hye; (KR).
JUNG, Joo Yun; (KR).
LEE, Eung-Sug; (KR)
Agent: PANKOREA PATENT AND LAW FIRM; 13F 70 Nonhyeon-ro 85-gil Gangnam-gu Seoul 06234 (KR)
Priority Data:
10-2016-0046280 15.04.2016 KR
Title (EN) METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURE USING NANOIMPRINT METHOD
(FR) PROCÉDÉ DE FABRICATION DE STRUCTURE TRIDIMENSIONNELLE À L'AIDE D'UN PROCÉDÉ DE NANO-IMPRESSION
(KO) 나노임프린트 방식을 이용한 3차원 구조체의 제조방법
Abstract: front page image
(EN)A method for manufacturing a three-dimensional structure using a nanoimprint method, according to an embodiment of the present invention, comprises: a stamp preparation step of preparing a stamp having a processed convex-concave part; a release layer formation step of forming a release layer on the stamp comprising the convex-concave part; a material formation step of forming at least one material of several tens of nanometers to several hundreds of nanometers so as to form a functional layer on the convex-concave part which has completed the release layer formation step; a material stacking step of stacking the material, formed on the convex-concave part, on a substrate; and a functional layer fixing step of applying at least one of pressure, heat and pressure, and light and pressure to the material to bond the material to a bottom material, wherein the aforementioned steps are sequentially repeated to manufacture a three-dimensional structure having a plurality of pores.
(FR)La présente invention concerne un procédé de fabrication d'une structure tridimensionnelle à l'aide d'un procédé de nano-impression, qui comprend : une étape de préparation de timbre consistant à préparer un timbre ayant une partie convexe-concave traitée ; une étape de formation de couche antiadhésive consistant à former une couche antiadhésive sur le timbre comprenant la partie convexe-concave ; une étape de formation de matériau consistant à former au moins un matériau de plusieurs dizaines de nanomètres à plusieurs centaines de nanomètres de façon à former une couche fonctionnelle sur la partie convexe-concave qui a subi l'étape de formation de couche antiadhésive ; une étape d'empilement de matériau consistant à empiler le matériau, formé sur la partie convexe-concave, sur un substrat ; et une étape de fixation de couche fonctionnelle consistant à appliquer au moins une pression, de la chaleur et une pression et/ou une lumière et une pression sur le matériau pour coller le matériau sur un matériau de fond, les étapes mentionnées ci-dessus étant répétées séquentiellement pour fabriquer une structure tridimensionnelle ayant une pluralité de pores.
(KO)본 발명의 일 실시예에 따른 나노임프린트 방식을 이용한 3차원 구조체의 제조방법은, 요철부가 가공된 스탬프를 준비하는 스탬프준비단계와, 요철부를 포함한 스탬프에 이형층을 형성하는 이형층형성단계와, 이형층형성단계를 거친 요철부에 기능층을 형성하기 위해 하나 이상의 재료를 수십 나노미터 내지 수백 나노미터의 크기로 형성하는 재료형성단계와, 기판 상에 요철부에 형성된 재료를 적층하는 재료적층단계 및 재료에 압력, 열과 압력, 빛과 압력 중 어느 하나를 가하여 재료를 하단의 재료에 접합시키는 기능층고정단계를 포함하고, 상술한 단계를 순차적으로 반복 실시하여 내부에 다수의 기공이 형성되는 3차원 구조체를 제조할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)