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1. (WO2017179278) OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHODS FOR MAKING SAME
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Pub. No.: WO/2017/179278 International Application No.: PCT/JP2017/004812
Publication Date: 19.10.2017 International Filing Date: 09.02.2017
IPC:
C04B 35/01 (2006.01) ,C04B 35/453 (2006.01) ,C04B 37/02 (2006.01) ,C23C 14/34 (2006.01)
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
01
based on oxides
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
01
based on oxides
453
based on zinc, tin or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
37
Joining burned ceramic articles with other burned ceramic articles or other articles by heating
02
with metallic articles
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
Applicants:
株式会社コベルコ科研 KOBELCO RESEARCH INSTITUTE, INC. [JP/JP]; 兵庫県神戸市中央区脇浜海岸通1丁目5番1号 1-5-1, Wakinohama-kaigan-dori, Chuo-ku, Kobe-shi, Hyogo 6510073, JP
Inventors:
田尾 幸樹 TAO, Yuki; --
中根 靖夫 NAKANE, Yasuo; --
畠 英雄 HATA, Hideo; --
Agent:
鮫島 睦 SAMEJIMA, Mutsumi; JP
山尾 憲人 YAMAO, Norihito; JP
Priority Data:
2016-08033313.04.2016JP
2017-00784819.01.2017JP
Title (EN) OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHODS FOR MAKING SAME
(FR) CORPS FRITTÉ D'OXYDE, CIBLE DE PULVÉRISATION ET LEURS PROCÉDÉS DE PRODUCTION
(JA) 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法
Abstract:
(EN) An oxide sintered body that includes 50 to 500 ppm of zirconium, and satisfies formulas (1) to (3) when the percentages (atom%) of contents of zinc, indium, gallium, and tin with respect to all metal elements excluding oxygen are, respectively, [Zn], [In], [Ga], and [Sn]. 35 atom%≤[Zn]≤55 atom% (1) 20 atom%≤([In]+[Ga])≤55 atom% (2) 5 atom%≤[Sn]≤25 atom% (3)
(FR) L'invention concerne un corps fritté d'oxyde qui comprend de 50 à 500 ppm de zirconium, et satisfait aux formules (1) à (3) lorsque les pourcentages (% atomique) de teneurs en zinc, en indium, en gallium et en étain par rapport à tous les éléments métalliques à l'exclusion de l'oxygène sont, respectivement, [Zn], [In], [Ga] et [Sn]. 35 % atomique ≤ [Zn] ≤ 55 % atomique (1) 20 % atomique ≤ ([In] + [Ga]) ≤ 55 % atomique (2) 5 % atomique ≤ [Sn] ≤ 25 % atomique (3)
(JA) ジルコニウムを50~500ppm含有し、酸素を除く全金属元素に対する、亜鉛、インジウム、ガリウム及び錫の含有量の割合(原子%)を夫々、[Zn]、[In]、[Ga]及び[Sn]としたとき、下記式(1)~(3)を満足する酸化物焼結体である。 35原子%≦[Zn]≦55原子%・・・(1) 20原子%≦([In]+[Ga])≦55原子%・・・(2) 5原子%≦[Sn]≦25原子%・・・(3)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)