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1. (WO2017179278) OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHODS FOR MAKING SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/179278    International Application No.:    PCT/JP2017/004812
Publication Date: 19.10.2017 International Filing Date: 09.02.2017
IPC:
C04B 35/01 (2006.01), C04B 35/453 (2006.01), C04B 37/02 (2006.01), C23C 14/34 (2006.01)
Applicants: KOBELCO RESEARCH INSTITUTE, INC. [JP/JP]; 1-5-1, Wakinohama-kaigan-dori, Chuo-ku, Kobe-shi, Hyogo 6510073 (JP)
Inventors: TAO, Yuki; (--).
NAKANE, Yasuo; (--).
HATA, Hideo; (--)
Agent: SAMEJIMA, Mutsumi; (JP).
YAMAO, Norihito; (JP)
Priority Data:
2016-080333 13.04.2016 JP
2017-007848 19.01.2017 JP
Title (EN) OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHODS FOR MAKING SAME
(FR) CORPS FRITTÉ D'OXYDE, CIBLE DE PULVÉRISATION ET LEURS PROCÉDÉS DE PRODUCTION
(JA) 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法
Abstract: front page image
(EN)An oxide sintered body that includes 50 to 500 ppm of zirconium, and satisfies formulas (1) to (3) when the percentages (atom%) of contents of zinc, indium, gallium, and tin with respect to all metal elements excluding oxygen are, respectively, [Zn], [In], [Ga], and [Sn]. 35 atom%≤[Zn]≤55 atom% (1) 20 atom%≤([In]+[Ga])≤55 atom% (2) 5 atom%≤[Sn]≤25 atom% (3)
(FR)L'invention concerne un corps fritté d'oxyde qui comprend de 50 à 500 ppm de zirconium, et satisfait aux formules (1) à (3) lorsque les pourcentages (% atomique) de teneurs en zinc, en indium, en gallium et en étain par rapport à tous les éléments métalliques à l'exclusion de l'oxygène sont, respectivement, [Zn], [In], [Ga] et [Sn]. 35 % atomique ≤ [Zn] ≤ 55 % atomique (1) 20 % atomique ≤ ([In] + [Ga]) ≤ 55 % atomique (2) 5 % atomique ≤ [Sn] ≤ 25 % atomique (3)
(JA)ジルコニウムを50~500ppm含有し、酸素を除く全金属元素に対する、亜鉛、インジウム、ガリウム及び錫の含有量の割合(原子%)を夫々、[Zn]、[In]、[Ga]及び[Sn]としたとき、下記式(1)~(3)を満足する酸化物焼結体である。 35原子%≦[Zn]≦55原子%・・・(1) 20原子%≦([In]+[Ga])≦55原子%・・・(2) 5原子%≦[Sn]≦25原子%・・・(3)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)