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1. (WO2017178276) MAPPING OF PATTERNS BETWEEN DESIGN LAYOUT AND PATTERNING DEVICE

Pub. No.:    WO/2017/178276    International Application No.:    PCT/EP2017/057931
Publication Date: Fri Oct 20 01:59:59 CEST 2017 International Filing Date: Wed Apr 05 01:59:59 CEST 2017
IPC: G03F 1/36
G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: HSU, Duan-Fu, Stephen
LIU, Jingjing
Title: MAPPING OF PATTERNS BETWEEN DESIGN LAYOUT AND PATTERNING DEVICE
Abstract:
Disclosed herein is a method comprising: obtaining at least a clip of a design layout; and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. In a further embodiment of the method, the method comprises: obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.