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1. (WO2017178209) METHOD AND APPARATUS FOR POSITIONING A MICRO- OR NANO-OBJECT UNDER VISUAL OBSERVATION
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Pub. No.: WO/2017/178209 International Application No.: PCT/EP2017/056982
Publication Date: 19.10.2017 International Filing Date: 23.03.2017
IPC:
G01Q 30/02 (2010.01) ,G01Q 60/60 (2010.01) ,H01L 21/18 (2006.01) ,G02B 1/11 (2015.01) ,G02B 21/34 (2006.01)
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
30
Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
02
Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
60
Particular types of SPM [Scanning-Probe Microscopy] or apparatus therefor; Essential components thereof
60
SECM [Scanning Electro-Chemical Microscopy] or apparatus therefor, e.g. SECM probes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
10
Optical coatings produced by application to, or surface treatment of, optical elements
11
Anti-reflection coatings
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21
Microscopes
34
Microscope slides, e.g. mounting specimens on microscope slides
Applicants:
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES [FR/FR]; 25 rue Leblanc - Bâtiment "Le Ponant D" 75015 PARIS, FR
Inventors:
CAMPIDELLI, Stéphane; FR
CORNUT, Renaud; FR
DERYCKE, Vincent; FR
AUSSERRE, Dominique; FR
AUSSERRE, Manuel; FR
Agent:
PRIORI, Enrico; FR
Priority Data:
165324713.04.2016FR
Title (EN) METHOD AND APPARATUS FOR POSITIONING A MICRO- OR NANO-OBJECT UNDER VISUAL OBSERVATION
(FR) PROCEDE ET APPAREIL DE POSITIONNEMENT D'UN MICRO- OU NANO-OBJET SOUS CONTROLE VISUEL
Abstract:
(EN) Method for moving a micro- or nano-object (SLM, F2D2) into position above a planar holder (SAC) under visual observation, characterized in that: said micro- or nano-object is submerged in a transparent medium, called the ambient medium (MA), having a refractive index n3; said planar holder comprises a transparent substrate (SS) of refractive index n0>n3 on which is deposited at least one optically absorbent layer (CA) that is able to behave as an antireflection coating when illuminated at normal incidence at an illuminating wavelength λ through said substrate; and the visual observation comprises illuminating said micro- or nano-object at least at said wavelength λ through said substrate, and also observing it through said substrate. Application of such a method to scanning probe microscopy and to the assembly of nanostructures.
(FR) Procédé de positionnement d'un micro- ou nano-objet (SLM, F2D2) au-dessus d'un support plan (SAC) par déplacement effectué sous contrôle visuel, caractérisé en ce que : ledit micro- ou nano-objet est immergé dans un milieu transparent, dit milieu ambiant (MA), présentant un indice de réfraction n3; ledit support plan comprend un substrat transparent (SS) d'indice de réfraction n0>n3 sur lequel est déposée au moins une couche optiquement absorbante (CA), adaptée pour se comporter en tant que revêtement antireflet lorsqu'elle est éclairée en incidence normale à une longueur d'onde d'éclairage λ à travers ledit substrat; et le contrôle visuel comprend l'éclairage dudit micro- ou nano-objet au moins à ladite longueur d'onde λ à travers ledit substrat, et son observation également à travers ledit substrat. Application d'un tel procédé à la microscopie à balayage par sonde locale et à l'assemblage de nanostructrures.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)