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1. (WO2017178171) ANTIREFLECTIVE GLASS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/178171 International Application No.: PCT/EP2017/055854
Publication Date: 19.10.2017 International Filing Date: 13.03.2017
IPC:
C03C 23/00 (2006.01)
Applicants: AGC GLASS EUROPE[BE/BE]; Avenue Jean Monnet, 4 1348 Louvain-La-Neuve, BE
AGC GLASS COMPANY NORTH AMERICA[US/US]; 11175 Cicero Drive Suite 400 Alpharetta, GA 30022-1167, US
ASAHI GLASS CO LTD[JP/JP]; Shin-Marunouchi Building1-5-1 MarunouchiChiyoda Ku Tokyo 100-8405, JP
QUERTECH INGÉNIERIE[FR/FR]; 9, rue de la Girafe 14000 Caen, FR
Inventors: NAVET, Benjamine; BE
BOULANGER, Pierre; BE
BUSARDO, Denis; FR
Agent: AGUSTSSON, Sveinn, Otto; BE
Priority Data:
16164910.812.04.2016EP
Title (EN) ANTIREFLECTIVE GLASS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
(FR) SUBSTRAT EN VERRE ANTIREFLET ET SON PROCÉDÉ DE FABRICATION
Abstract:
(EN) The invention concerns a method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A comprised between 13 kV and 40 kV and setting the ion dosage at a value comprised between 5.56 x 1014 x A/kV + 4.78 x 1016 ions/cm2 and -2.22 x 1016 x A/kV + 1.09 x 1018 ions/cm2. The invention further concerns antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
(FR) L'invention concerne un procédé permettant de fabriquer des substrats en verre antireflet par implantation ionique, ledit procédé consistant à sélectionner un gaz source de N2 ou d'O2, à ioniser le gaz source de manière à former un mélange d'ions à charge unique et à charges multiples de N ou d'O, à former un faisceau d'ions à charge unique et à charges multiples de N ou d'O par accélération avec une tension d'accélération A comprise entre 13 kV et 40 kV et à établir la dose d'ions à une valeur comprise entre 5,56 x 1014 x A/kV + 4,78 x 1016 ions/cm2 et -2,22 x 1016 x A/kV + 1,09 x 1018 ions/cm2. L'invention concerne en outre des substrats en verre antireflet comprenant une surface traitée par implantation ionique avec un mélange d'ions à charge unique et à charges multiples selon ledit procédé.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)