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1. (WO2017178167) ANTIREFLECTIVE, SCRATCH-RESISTANT GLASS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
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Pub. No.: WO/2017/178167 International Application No.: PCT/EP2017/055848
Publication Date: 19.10.2017 International Filing Date: 13.03.2017
IPC:
C03C 23/00 (2006.01)
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
23
Other surface treatment of glass not in the form of fibres or filaments
Applicants:
AGC GLASS EUROPE [BE/BE]; Avenue Jean Monnet, 4 1348 Louvain-La-Neuve, BE
AGC GLASS COMPANY NORTH AMERICA [US/US]; 11175 Cicero Drive Suite 400 Alpharetta, GA Georgia/Georgia 30022-1167, US
AGC Inc. [JP/JP]; Shin-Marunouchi Building 1-5-1 MarunouchiChiyoda Ku Tokyo, Tokyo/Tokyo 100-8405, JP
QUERTECH INGÉNIERIE [FR/FR]; 9, rue de la Girafe 14000 Caen, FR
Inventors:
NAVET, Benjamine; BE
BOULANGER, Pierre; BE
BUSARDO, Denis; FR
Agent:
AGUSTSSON, Sveinn Otto; BE
Priority Data:
16164909.012.04.2016EP
Title (EN) ANTIREFLECTIVE, SCRATCH-RESISTANT GLASS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
(FR) SUBSTRAT EN VERRE ANTIREFLET RÉSISTANT AUX ÉRAFLURES ET SON PROCÉDÉ DE FABRICATION
Abstract:
(EN) The invention concerns a method for manufacturing scratch-resistant antireflective glass substrates by ion implantation, comprising ionizing a source gas of N2 so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N, by accelerating with an acceleration voltage comprised between 20 kV and 30 kV and an ion dosage comprised between 5 x 1016 ions/cm2 and 1017 ions/cm2. The invention further concerns scratch-resistant antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
(FR) L'invention concerne un procédé permettant de fabriquer des substrats en verre antireflet résistants aux éraflures par implantation ionique, ledit procédé consistant à ioniser un gaz source de N2 de manière à former un mélange d'ions à charge unique et à charges multiples de N, à former un faisceau d'ions à charge unique et à charges multiples de N par accélération avec une tension d'accélération comprise entre 20 kV et 30 kV et à établir la dose d'ions à une valeur comprise entre 5 x 1016 ions/cm2 et 1017 ions/cm2. L'invention concerne en outre des substrats en verre antireflet résistants aux éraflures comprenant une surface traitée par implantation ionique avec un mélange d'ions à charge unique et à charges multiples selon ledit procédé.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)