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1. (WO2017175562) MATERIAL, STORAGE CONTAINER USING SAID MATERIAL, VALVE INSTALLED ON SAID STORAGE CONTAINER AS WELL AS CIF STORAGE METHOD AND CIF STORAGE CONTAINER USE METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/175562    International Application No.:    PCT/JP2017/010752
Publication Date: 12.10.2017 International Filing Date: 16.03.2017
IPC:
C23C 8/08 (2006.01), C23C 28/00 (2006.01)
Applicants: KANTO DENKA KOGYO CO., LTD. [JP/JP]; 2-105, Kanda-Awajicho, Chiyoda-ku, Tokyo 1010063 (JP)
Inventors: TAKIZAWA, Hiroki; (JP).
KIKUCHI, Sho; (JP).
SHIBUSAWA, Yukinobu; (JP)
Agent: HAGI, Norio; (JP)
Priority Data:
2016-075797 05.04.2016 JP
Title (EN) MATERIAL, STORAGE CONTAINER USING SAID MATERIAL, VALVE INSTALLED ON SAID STORAGE CONTAINER AS WELL AS CIF STORAGE METHOD AND CIF STORAGE CONTAINER USE METHOD
(FR) MATÉRIAU, CONTENANT DE STOCKAGE UTILISANT LEDIT MATÉRIAU, VANNE INSTALLÉE SUR LEDIT CONTENANT DE STOCKAGE ET PROCÉDÉ DE STOCKAGE DE FLUORURE DE CHLORE ET PROCÉDÉ D'UTILISATION DE CONTENANT DE STOCKAGE FLUORURE DE CHLORE
(JA) 材料、この材料を用いた保存容器、この保存容器に取り付けられるバルブ、並びに、ClFの保存方法、ClFの保存容器の使用方法
Abstract: front page image
(EN)At least a portion of a material has a fluoride passive film (28) resulting from contact with a ClF-containing gas.
(FR)Selon l'invention, au moins une partie d'un matériau possède un film passif au fluorure (28) résultant du contact avec un gaz contenant du ClF.
(JA)材料の少なくとも一部に、ClFを含むガスとの接触によるフッ化物の不動態被膜(28)を有する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)