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1. (WO2017175518) METHOD FOR MANUFACTURING SILICON MATERIAL
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Pub. No.: WO/2017/175518 International Application No.: PCT/JP2017/007757
Publication Date: 12.10.2017 International Filing Date: 28.02.2017
IPC:
C01B 33/021 (2006.01) ,H01M 4/38 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33
Silicon; Compounds thereof
02
Silicon
021
Preparation
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
M
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
4
Electrodes
02
Electrodes composed of, or comprising, active material
36
Selection of substances as active materials, active masses, active liquids
38
of elements or alloys
Applicants:
株式会社豊田自動織機 KABUSHIKI KAISHA TOYOTA JIDOSHOKKI [JP/JP]; 愛知県刈谷市豊田町2丁目1番地 2-1, Toyoda-cho, Kariya-shi, Aichi 4488671, JP
Inventors:
原田 正則 HARATA, Masanori; JP
毛利 敬史 MOHRI, Takashi; JP
合田 信弘 GODA, Nobuhiro; JP
井山 彩人 IYAMA, Ayato; JP
Agent:
特許業務法人 共立 KYORITSU INTERNATIONAL; 愛知県名古屋市中村区名駅3丁目2番5号 2-5, Meieki 3-chome, Nakamura-ku, Nagoya-shi, Aichi 4500002, JP
Priority Data:
2016-07679806.04.2016JP
Title (EN) METHOD FOR MANUFACTURING SILICON MATERIAL
(FR) PROCÉDÉ DE FABRICATION DE MATÉRIAU DE SILICIUM
(JA) シリコン材料の製造方法
Abstract:
(EN) Provided is a manufacturing method whereby a silicon material can be manufactured by a small number of steps. A method for manufacturing a silicon material, characterized by including a reaction step for applying CaSi2 to a molten salt containing NaCl.
(FR) L'invention concerne un procédé de fabrication par lequel un matériau en silicium peut être fabriqué en un petit nombre d'étapes. L'invention concerne également un procédé de fabrication d'un matériau de silicium, caractérisé en ce qu'il comprend une étape de réaction pour appliquer du CaSi2 à un sel fondu contenant du NaCl.
(JA) 少ない工程数でシリコン材料を製造できる製造方法を提供する。 NaClを含有する溶融塩にCaSiを作用させてシリコン材料とする反応工程を含むことを特徴とするシリコン材料の製造方法。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)