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1. (WO2017173094) APPARATUS AND METHODS FOR WAFER ROTATION IN CAROUSEL SUSCEPTOR

Pub. No.:    WO/2017/173094    International Application No.:    PCT/US2017/025041
Publication Date: Fri Oct 06 01:59:59 CEST 2017 International Filing Date: Fri Mar 31 01:59:59 CEST 2017
IPC: H01L 21/02
H01L 21/683
H01L 21/687
H01L 21/205
Applicants: APPLIED MATERIALS, INC.
Inventors: GANGAKHEDKAR, Kaushal
YUDOVSKY, Joseph
Title: APPARATUS AND METHODS FOR WAFER ROTATION IN CAROUSEL SUSCEPTOR
Abstract:
Apparatus and method for processing a plurality of substrates in a batch processing chamber are described. The apparatus comprises a susceptor assembly, a lift assembly and a rotation assembly. The susceptor assembly has a top surface and a bottom surface with a plurality of recesses in the top surface. Each of the recesses has a lift pocket in the recess bottom. The lift assembly including a lift plate having a top surface to contact the substrate. The lift plate is connected to a lift shaft that extends through the susceptor assembly and connects to a lift friction pad. The rotation assembly has a rotation friction pad that contacts the lift friction pad. The rotation friction pad is connected to a rotation shaft and can be vertically aligned with the lift friction pad.