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1. (WO2017172873) ELECTROSTATIC DISSIPATING MAT
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/172873 International Application No.: PCT/US2017/024689
Publication Date: 05.10.2017 International Filing Date: 29.03.2017
IPC:
C08G 65/24 (2006.01) ,C08G 65/14 (2006.01) ,C08G 65/22 (2006.01) ,C09K 3/16 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65
Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
02
from cyclic ethers by opening of the heterocyclic ring
04
from cyclic ethers only
22
Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
24
Epihalohydrins
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65
Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
02
from cyclic ethers by opening of the heterocyclic ring
04
from cyclic ethers only
06
Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
14
Unsaturated oxiranes
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65
Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
02
from cyclic ethers by opening of the heterocyclic ring
04
from cyclic ethers only
22
Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
16
Anti-static materials
Applicants: ZEON CHEMICALS L.P.[US/US]; 4100 Bells Lane Louisville, KY 40211, US
Inventors: MITTERMILLER, Andrew; US
CABLE, Clark; US
BAO, Zhiyi; US
Agent: CONLEY, Scott R.; US
GOLDSTEIN, Steven, J.; US
ACHESON, JR., Edwin, R.; US
KERSTING, Jeffrey, F.; US
SCHOEN, Ann, G.; US
Priority Data:
62/316,94901.04.2016US
Title (EN) ELECTROSTATIC DISSIPATING MAT
(FR) TAPIS DE DISSIPATION ÉLECTROSTATIQUE
Abstract:
(EN) An electrostatic mat, wherein the mat comprises at least one electrostatic layer, wherein the at least one layer comprises an elastomeric rubber, wherein the elastomeric rubber comprises 20-100phr elastomeric polyether, wherein the elastomeric polyether comprises 10-75wt% ethylene oxide, 20-70wt% epihalohydrin, and 0-10% vinyloxirane. The mat prevents the generation of voltage when it is walked on and/ or dissipates the charge that was generated.
(FR) Cette invention concerne un tapis électrostatique, ledit tapis comprenant au moins une couche électrostatique qui contient un caoutchouc élastomère constitué de 20 à 100 phr de polyéther élastomère, ledit polyéther élastomère comprenant de 10 à 75 % en poids d'oxyde d'éthylène, de 20 à 70 % en poids d'épihalohydrine, et 0 à 10 % de vinyloxyrane. Le tapis empêche la génération d'une tension quand on marche dessus et/ou dissipe la charge qui a été générée.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)