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Machine translation
1. (WO2017172791) IMPRINT RESIST AND SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOGRAPHY
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/172791    International Application No.:    PCT/US2017/024570
Publication Date: 05.10.2017 International Filing Date: 28.03.2017
IPC:
G03F 7/00 (2006.01), B29C 59/02 (2006.01), B82Y 10/00 (2011.01)
Applicants: CANON KABUSHIKI KAISHA [JP/JP]; 30-2, Shimomaruko 3-Chome, Ohta-ku Tokyo, 146-8501 (JP).
CANON NANOTECHNOLOGIES, INC. [US/US]; 1807 West Braker Lane C-300 Austin, Texas 78758 (US) (AE only)
Inventors: LIU, Weijun; (US).
STACHOWIAK, Timothy Brian; (US).
DEYOUNG, James P.; (US).
KHUSNATDINOV, Niyaz; (US)
Agent: KING, Cameron A.; (US)
Priority Data:
62/315,837 31.03.2016 US
15/469,224 24.03.2017 US
Title (EN) IMPRINT RESIST AND SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOGRAPHY
(FR) RÉSERVE D'IMPRESSION ET PRÉTRAITEMENT DE SUBSTRAT POUR RÉDUIRE LE TEMPS DE REMPLISSAGE EN LITHOGRAPHIE PAR NANO-IMPRESSION
Abstract: front page image
(EN)Facilitating throughput in nanoimprint lithography processes by using an imprint resist including fluorinated components and a substrate treated with a pretreatment composition to promote spreading of an imprint resist on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15.
(FR)La présente invention vise à faciliter le rendement de procédés de lithographie par nano-impression en utilisant une réserve d'impression comprenant des éléments fluorés et un substrat traité avec une composition de prétraitement pour favoriser l'étalement d'une réserve d'impression sur le substrat. L'énergie de surface interfaciale entre la composition de prétraitement et l'air dépasse l'énergie de surface interfaciale entre la réserve d'impression et l'air d'au moins 1 mN/m, et l'angle de contact de la réserve d'impression sur la surface du gabarit de lithographie par nano-impression est inférieur à 15.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)