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1. (WO2017172536) CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/172536    International Application No.:    PCT/US2017/024138
Publication Date: 05.10.2017 International Filing Date: 24.03.2017
IPC:
H01L 21/3065 (2006.01), H01L 21/66 (2006.01), H01L 21/02 (2006.01), H01L 21/67 (2006.01), H05H 1/46 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; Akasaka Biz Tower 3-1 Akasaka 5-chome Minato-ku, Tokyo 107-6325 (JP).
TOKYO ELECTRON U.S. HOLDINGS, INC. [US/US]; 2400 Grove Boulevard Austin, Texas 78741 (US) (JP only)
Inventors: COPPA, Brian J.; (US).
VEDHACHALAM, Deepak; (US).
DASSAPA, Francois C.; (US)
Agent: MITROVIC, Andrej; (US)
Priority Data:
62/316,021 31.03.2016 US
Title (EN) CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
(FR) COMMANDE DE CARACTÉRISTIQUES DE PROCESSUS DE GRAVURE À SEC À L'AIDE D'UNE SPECTROSCOPIE À ÉMISSION OPTIQUE DE NETTOYAGE À SEC SANS TRANCHE
Abstract: front page image
(EN)Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
(FR)La présente invention concerne des architectures, des plateformes et des procédés pour acquérir des spectres d'émission optique à partir d'un système de spectroscopie à émission optique par écoulement d'un gaz de nettoyage à sec dans une chambre de traitement au plasma du système de traitement au plasma et par allumage d'un plasma dans la chambre de traitement au plasma pour déclencher le processus de nettoyage à sec sans tranche.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)