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1. (WO2017172531) ROLL-TO-ROLL ATOMIC LAYER DEPOSITION APPARATUS AND METHOD

Pub. No.:    WO/2017/172531    International Application No.:    PCT/US2017/024096
Publication Date: Fri Oct 06 01:59:59 CEST 2017 International Filing Date: Sat Mar 25 00:59:59 CET 2017
IPC: C23C 16/54
C23C 16/455
Applicants: 3M INNOVATIVE PROPERTIES COMPANY
Inventors: LYONS, Christopher S.
DODGE, Bill H.
SPAGNOLA, Joseph C.
JERRY, Glen A.
GOYAL, Ameeta R.
SWANSON, Ronald P.
DOBBS, James N.
Title: ROLL-TO-ROLL ATOMIC LAYER DEPOSITION APPARATUS AND METHOD
Abstract:
A method is provided. The method may include engaging a first edge region on a first surface of a substrate with a first support roller; engaging a second edge region on the first surface of the substrate with a second support roller; transporting the substrate over the first and the second support rollers; repeating the following sequence of steps to form a thin film on the substrate: (a) exposing the substrate to a first precursor; (b) supplying a reactive species to the substrate after exposing the substrate to the first precursor; and depositing a vapor on the thin film to form a coating on the thin film.