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1. (WO2017171736) NANOWIRE FOR TRANSISTOR INTEGRATION
PCT Biblio. Data
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Pub. No.:
WO/2017/171736
International Application No.:
PCT/US2016/024810
Publication Date:
05.10.2017
International Filing Date:
30.03.2016
IPC:
H01L 21/336
(2006.01),
H01L 29/78
(2006.01)
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or A
III
B
V
compounds with or without impurities, e.g. doping materials
334
Multistep processes for the manufacture of devices of the unipolar type
335
Field-effect transistors
336
with an insulated gate
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29
Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof
66
Types of semiconductor device
68
controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified, or switched
76
Unipolar devices
772
Field-effect transistors
78
with field effect produced by an insulated gate
Applicants:
INTEL CORPORATION
[US/US]; 2200 Mission College Boulevard Santa Clara, California 95054-1549 (US)
Inventors:
GLASS, Glenn A.
; (US).
MOHAPATRA, Chandra S.
; (US).
MURTHY, Anand S.
; (US).
JAMBUNATHAN, Karthik
; (US)
Agent:
PEMBERTON, John D.
; (US)
Priority Data:
Title
(EN)
NANOWIRE FOR TRANSISTOR INTEGRATION
(FR)
NANOFIL POUR INTÉGRATION DE TRANSISTOR
Abstract:
(EN)
Particular embodiments described herein provide for an electronic device that can include a nanowire channel. The nanowire channel can include nanowires and the nanowires can be about fifteen (15) or less angstroms apart. The nanowire channel can include more than ten (10) nanowires and can be created from a MXene material.
(FR)
Des modes de réalisation particuliers de l'invention concernent un dispositif électronique qui peut comprendre un canal de nanofil. Le canal de nanofil peut comprendre des nanofils et les nanofils peuvent être espacés d'une distance inférieure ou égale à environ quinze (15) angströms. Le canal de nanofil peut comprendre plus de dix (10) nanofils et peut être créé à partir d'un matériau MXène.
Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language:
English (
EN
)
Filing Language:
English (
EN
)