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1. (WO2017171282) METAL PARTS AND METHOD FOR MANUFACTURING SAME AND PROCESS CHAMBER PROVIDED WITH METAL PARTS
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Pub. No.: WO/2017/171282 International Application No.: PCT/KR2017/002921
Publication Date: 05.10.2017 International Filing Date: 20.03.2017
IPC:
C25D 11/02 (2006.01) ,C25D 11/12 (2006.01) ,C25D 11/18 (2006.01) ,C25D 11/24 (2006.01) ,C25D 11/04 (2006.01) ,C25D 21/12 (2006.01) ,C23C 16/44 (2006.01) ,C25D 11/10 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
12
Anodising more than once, e.g. in different baths
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
18
After-treatment, e.g. pore-sealing
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
18
After-treatment, e.g. pore-sealing
24
Chemical after-treatment
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
21
Processes for servicing or operating cells for electrolytic coating
12
Process control or regulation
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
06
characterised by the electrolytes used
10
containing organic acids
Applicants:
에이비엠 주식회사 ABM CO., LTD. [KR/KR]; 충청남도 아산시 둔포면 아산밸리로 142, 4 4Dong, 142, Asan valley-ro, Dunpo-myeon Asan-si Chungcheongnam-do 31409, KR
Inventors:
안범모 AHN, Bum Mo; KR
박승호 PARK, Seung Ho; KR
Agent:
최광석 CHOI, Kwang seok; KR
Priority Data:
10-2016-003925731.03.2016KR
Title (EN) METAL PARTS AND METHOD FOR MANUFACTURING SAME AND PROCESS CHAMBER PROVIDED WITH METAL PARTS
(FR) PIÈCES MÉTALLIQUES ET LEUR PROCÉDÉ DE FABRICATION, ET CHAMBRE DE TRAITEMENT POURVUE DE PIÈCES MÉTALLIQUES
(KO) 금속부품 및 그 제조 방법 및 금속부품을 구비한 공정챔버
Abstract:
(EN) The present invention relates to a metal part and a process chamber having the metal part and, more particularly, to a metal part and a process chamber provided with the same, the metal part enabling a process failure and a production yield decrease of a display or a semiconductor to be prevented by forming a hole-free anodization barrier layer on the surface of a metal part used in a display or semiconductor manufacturing process and a process chamber having the same.
(FR) La présente invention concerne une pièce métallique et une chambre de traitement comportant la pièce métallique et, plus particulièrement, une pièce métallique et une chambre de traitement pourvue de celle-ci, la pièce métallique permettant d'éviter des défaillances de traitement et une diminution du rendement de production d'un dispositif d'affichage ou d'un semi-conducteur, grâce à la formation d'une couche de barrière d'anodisation sans trou sur la surface d'une pièce métallique utilisée dans un procédé de fabrication de dispositif d'affichage ou de semi-conducteur et dans une chambre de traitement la renfermant.
(KO) 본 발명은 금속부품 및 이를 구비한 공정챔버에 관한 것으로, 특히, 디스플레이 또는 반도체 제조 공정에 사용되는 금속부품 및 이를 구비한 공정챔버의 표면에 구멍이 없는 양극산화 배리어층을 형성하여, 디스플레이 또는 반도체의 공정 불량 및 생산수율 저하를 방지할 수 있는 금속부품 및 이를 구비한 공정챔버에 관한 것이다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)