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1. (WO2017170955) COMPOSITION
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Pub. No.:    WO/2017/170955    International Application No.:    PCT/JP2017/013449
Publication Date: 05.10.2017 International Filing Date: 30.03.2017
C08F 2/44 (2006.01), C08F 291/02 (2006.01), C09J 4/00 (2006.01), C09J 11/04 (2006.01), C09J 201/00 (2006.01)
Applicants: DENKA COMPANY LIMITED [JP/JP]; 1-1,Nihonbashi-Muromachi 2-chome,Chuo-ku, Tokyo 1038338 (JP)
Inventors: SERIZAWA,Shinya; (JP).
SASAKI,Makiko; (JP).
Agent: AXIS PATENT INTERNATIONAL; Shimbashi i-mark Bldg., 6-2 Shimbashi 2-Chome, Minato-ku, Tokyo 1050004 (JP)
Priority Data:
2016-070072 31.03.2016 JP
(JA) 組成物
Abstract: front page image
(EN)Provided is a composition which exhibits sufficient adhesive strength even after a high-temperature treatment. The composition comprises (1) polymerizable monomers comprising an ingredient (1-1) which is a monofunctional polymerizable monomer having an aromatic ring and an ingredient (1-2) which is a polymerizable monomer other than the ingredient (1-1), (2) an elastomer, (3) a polymerization initiator, (4) a reducing agent, and (5) an inorganic anion exchanger.
(FR)L'invention concerne une composition qui présente une force d'adhésion suffisante même après un traitement à haute température. La composition comprend (1) des monomères polymérisables comprenant un ingrédient (1-1) qui est un monomère polymérisable monofonctionnel ayant un noyau aromatique et un ingrédient (1-2) qui est un monomère polymérisable autre que l'ingrédient (1-1), (2) un élastomère, (3) un amorceur de polymérisation, (4) un agent réducteur et (5) un échangeur d'anions inorganiques.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)