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1. (WO2017170172) FILM FORMATION MASK, METHOD FOR MANUFACTURING SAME, AND METHOD FOR REPAIRING FILM FORMATION MASK
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Pub. No.: WO/2017/170172 International Application No.: PCT/JP2017/011844
Publication Date: 05.10.2017 International Filing Date: 23.03.2017
IPC:
C23C 14/04 (2006.01) ,C23C 14/24 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
Applicants:
株式会社ブイ・テクノロジー V TECHNOLOGY CO., LTD. [JP/JP]; 神奈川県横浜市保土ヶ谷区神戸町134番地 134, Godo-cho, Hodogaya-ku, Yokohama-shi, Kanagawa 2400005, JP
Inventors:
工藤 修二 KUDO, Shuji; JP
野口 良 NOGUCHI, Ryo; JP
齋藤 雄二 SAITO, Yuji; JP
韓 智華 HAN, Zhihua; JP
Agent:
小川 護晃 OGAWA, Moriaki; JP
西山 春之 NISHIYAMA, Haruyuki; JP
奥山 尚一 OKUYAMA, Shoichi; JP
Priority Data:
2016-06667829.03.2016JP
2016-24133313.12.2016JP
Title (EN) FILM FORMATION MASK, METHOD FOR MANUFACTURING SAME, AND METHOD FOR REPAIRING FILM FORMATION MASK
(FR) MASQUE DE FORMATION DE FILM, PROCÉDÉ POUR LA FABRICATION DE CELUI-CI ET PROCÉDÉ POUR LA RÉPARATION DE MASQUE DE FORMATION DE FILM
(JA) 成膜マスク、その製造方法及び成膜マスクのリペア方法
Abstract:
(EN) In the present invention, on a film layer 4 provided with a plurality of open patterns 7, there are provided: a mask sheet 1 in which a metal layer 5 provided with a plurality of through holes 8 including at least one of the open patterns 7 is layered, one surface of the mask sheet 1 being divided into a plurality of unit cells 6 within which the plurality of open patterns 7 and through holes 8 are present; and a metal support member 2 which is joined to and supports the metal layer 5 of the mask sheet 1 in a state in which there is no external tension, and which has openings 10 corresponding to the unit cells 6 of the mask sheet 1. Through this configuration, high shape precision and positional precision are ensured in film formation of a thin-film pattern.
(FR) Selon la présente invention, les éléments suivants sont disposés sur une couche de film (4) pourvue d’une pluralité de motifs ouverts (7) : une feuille de masque (1) sur laquelle une couche métallique (5) pourvue d’une pluralité de trous traversants (8) comprenant au moins l’un des motifs ouverts (7) est disposée en couche, une surface de la feuille de masque (1) étant divisée en une pluralité de cellules unitaires (6) à l’intérieur desquelles la pluralité de motifs ouverts (7) et de trous traversants (8) sont présents ; et un élément de support métallique (2) qui est uni à la couche métallique (5) de la feuille de masque (1) et la supporte dans un état dans lequel il n’y a pas de tension externe et qui a des ouvertures (10) correspondant aux cellules unitaires (6) de la feuille de masque (1). Grâce à cette configuration, une précision de forme et une précision de position élevées sont garanties dans la formation de film d’un motif de film mince.
(JA) 本発明は、複数の開口パターン7を設けたフィルム層4上に、少なくとも一つの前記開口パターン7を内包する複数の貫通孔8を設けたメタル層5を積層すると共に、一面を複数の前記開口パターン7及び貫通孔8が内在する複数の単位セル6に区画したマスクシート1と、外的なテンションがない状態の前記マスクシート1の前記メタル層5に接合してこれを支持し、前記マスクシート1の前記単位セル6に対応させて開口部10を有する金属製のサポート部材2と、を備えたものである。これにより、薄膜パターンの成膜に高い形状精度及び位置精度を確保する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)