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1. (WO2017169455) MASK MANUFACTURING APPARATUS AND METHOD FOR CONTROLLING MASK MANUFACTURING APPARATUS

Pub. No.:    WO/2017/169455    International Application No.:    PCT/JP2017/007690
Publication Date: Fri Oct 06 01:59:59 CEST 2017 International Filing Date: Wed Mar 01 00:59:59 CET 2017
IPC: G03F 7/20
H01L 21/68
Applicants: V TECHNOLOGY CO., LTD.
株式会社ブイ・テクノロジー
Inventors: YONEZAWA Makoto
米澤 良
Title: MASK MANUFACTURING APPARATUS AND METHOD FOR CONTROLLING MASK MANUFACTURING APPARATUS
Abstract:
The present invention improves pattern position accuracy. According to the present invention, a measurement value in the case where a measurement unit is assumed to be located at the positon of a light irradiation unit 43 is calculated on the basis of the weighted average value of values acquired by position measurement units 29 provided to both sides of a first movement unit 20 in a second direction and on the basis of the weighted average value of values acquired by position measurement units 39 provided to both sides, in a first direction, of a second movement unit having a second driving unit 30. The positional relation between the light irradiation unit 43 and a stage 41 is measured by laser interferometers 51, 52, and 53 through measurement of the position of a bar mirror provided to the stage 41 with the position of two mirrors provided to the light irradiation unit 32 set as the reference. Then, correction is made for the position measurement units 29 and 39 by comparing the measurements, and drawing is performed on a mask M by using measurements from the position measurement units 29 and 39 after correction.