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|1. (WO2017169018) SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE|
|Applicants:||SCREEN HOLDINGS CO., LTD.
|Title:||SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE|
According to the present invention, pure water, a liquid mixture, and an organic solvent are sequentially supplied onto a top surface (91) while a substrate (9) rotates at a relatively high rotation speed so that the liquid splashing from the top surface (91) is received by the inner surface of an outside cup part (25) during an outside cup facing state in which the upper end of an inside cup part (24) is disposed lower than the upper end of the outside cup part (25). Next, a filler solution is supplied onto the top surface (91) and the top surface (91) is covered with the filler solution during an inside cup facing state in which the inner surface of the inside cup part (24) is disposed around the substrate (9). Consequently, mixing of the filler solution and the pure water inside the inside cup part (24) is prevented and gelling and the like of the filler solution is also prevented. By supplying the liquid mixture in which the organic solvent and the pure water are mixed, the collapse of pattern elements formed on the top surface (91) is suppressed.