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1. (WO2017168773) VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, VAPOR DEPOSITION METHOD, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE
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Pub. No.: WO/2017/168773 International Application No.: PCT/JP2016/072069
Publication Date: 05.10.2017 International Filing Date: 27.07.2016
IPC:
C23C 14/24 (2006.01) ,C23C 14/04 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
Applicants: HON HAI PRECISION INDUSTRY CO., LTD.; No.2, Ziyou St., Tu-Cheng Dist., New Taipei City, TW
Inventors: SAKIO, Susumu; JP
NISHIDA, Koshi; JP
KISHIMOTO, Katsuhiko; JP
Agent: ASAHINA & CO.; NS Building, 2-22, Tanimachi 2-chome, Chuo-ku, Osaka-shi, Osaka 5400012, JP
Priority Data:
2016-06680429.03.2016JP
Title (EN) VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, VAPOR DEPOSITION METHOD, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE
(FR) MASQUE DE DÉPÔT EN PHASE VAPEUR, PROCÉDÉ DE FABRICATION D'UN MASQUE DE DÉPÔT EN PHASE VAPEUR, PROCÉDÉ DE DÉPÔT EN PHASE VAPEUR ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF D'AFFICHAGE ÉLECTROLUMINESCENT ORGANIQUE
(JA) 蒸着マスク、蒸着マスクの製造方法、蒸着方法および有機EL表示装置の製造方法
Abstract:
(EN) The present invention provides: a vapor deposition mask whereby adhesion is increased between a vapor deposition substrate and an open peripheral edge section of the vapor deposition mask during vapor deposition, film blurring or shadows during vapor deposition are suppressed, and high-precision patterning is possible; a method for manufacturing the same; and a vapor deposition method which uses the vapor deposition mask. A vapor deposition mask (1) includes a resin film (11) having a pattern of openings (12) for forming a thin-film pattern by vapor deposition on a vapor deposition substrate (2). In the vapor deposition mask (1), a magnetic metal film (13a) is provided to the surface of the resin film (11) in contact with the vapor deposition substrate (2), at least in peripheral edge sections of the openings (12) in the resin film (11), adhesion is increased between the vapor deposition substrate (2) and the peripheral edge sections of the openings (12) in the vapor deposition mask (1) during vapor deposition, and film blurring or shadows during vapor deposition are suppressed.
(FR) La présente invention concerne : un masque de dépôt en phase vapeur qui permet d'augmenter l'adhérence entre un substrat de dépôt en phase vapeur et une partie de bord périphérique ouverte du masque de dépôt en phase vapeur pendant le dépôt en phase vapeur, de supprimer un flou de film ou des ombres pendant le dépôt en phase vapeur et de former des motifs de haute précision ; un procédé de fabrication de ce dernier ; et un procédé de dépôt en phase vapeur qui utilise le masque de dépôt en phase vapeur. Le masque de dépôt en phase vapeur (1) comprend un film de résine (11) présentant un motif d'ouvertures (12) destiné à former un motif de couche mince par dépôt en phase vapeur sur un substrat de dépôt en phase vapeur (2). Dans le masque de dépôt en phase vapeur (1), un film de métal magnétique (13a) est disposé sur la surface du film de résine (11) en contact avec le substrat de dépôt de vapeur (2), au moins dans des parties de bord périphériques des ouvertures (12) dans le film de résine (11), l'adhérence est augmentée entre le substrat de dépôt en phase vapeur (2) et les sections de bord périphériques des ouvertures (12) dans le masque de dépôt en phase vapeur (1) pendant le dépôt en phase vapeur, et le flou de film ou les ombres sont supprimés pendant le dépôt en phase vapeur.
(JA) 蒸着時の被蒸着基板と蒸着マスクの開口周縁部との間の密着性を高め、膜ボケや蒸着時のシャドウの発生を抑制し、高精細なパターニングを行うことが可能な蒸着マスク、その製造方法およびその蒸着マスクを用いた蒸着方法の提供。蒸着マスク(1)は、被蒸着基板(2)上に蒸着により薄膜パターンを成膜形成するための開口(12)のパターンを有する樹脂フィルム(11)を含み、その蒸着マスク(1)は、磁性金属膜(13a)を、樹脂フィルム(11)の被蒸着基板(2)と当接する面の、少なくとも樹脂フィルム(11)の開口(12)の周縁部に備え、蒸着時の被蒸着基板(2)と蒸着マスク(1)の開口(12)の周縁部との間の密着性を高め、膜ボケや蒸着時のシャドウの発生を抑える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)