Search International and National Patent Collections

1. (WO2017157602) OPTICAL DEVICE FOR A LITHOGRAPHY SYSTEM, AND LITHOGRAPHY SYSTEM

Pub. No.:    WO/2017/157602    International Application No.:    PCT/EP2017/053289
Publication Date: Fri Sep 22 01:59:59 CEST 2017 International Filing Date: Wed Feb 15 00:59:59 CET 2017
IPC: G03F 7/20
G02B 7/182
Applicants: CARL ZEISS SMT GMBH
Inventors: ZWEERING, Ralf
Title: OPTICAL DEVICE FOR A LITHOGRAPHY SYSTEM, AND LITHOGRAPHY SYSTEM
Abstract:
The invention relates to an optical device (200A, 200B, 200C, 200D, 200E) for a lithography system (100A, 100B), comprising an optical element (202), a supporting frame (204), which supports the optical element (202), a sensor frame (206), which is mechanically decoupled from the supporting frame (204), wherein a gap (210) is provided between the supporting frame (204) and the sensor frame (206), and a sensor assembly (208), which is designed to determine a width (b210) of the gap (210) in a contactless manner, wherein the sensor assembly (208) has a contact element (216) and a contact surface (212) and wherein the contact element (216) is designed to contact the contact surface (212) in order to limit relative motion of the supporting frame (204) relative to the sensor frame (206).