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1. (WO2017156873) EVAPORATION MASK PLATE, METHOD FOR PATTERNING SUBSTRATE WITH SAME, AND DISPLAY SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/156873 International Application No.: PCT/CN2016/083442
Publication Date: 21.09.2017 International Filing Date: 26.05.2016
IPC:
C23C 14/04 (2006.01) ,H01L 51/56 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Road, Chaoyang District Beijing 100015, CN
合肥鑫晟光电科技有限公司 HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国安徽省合肥市 新站区工业园内 Xinzhan Industrial Park Hefei, Anhui 230012, CN
Inventors:
张沈钧 CHANG, Shenchun; CN
Agent:
中国专利代理(香港)有限公司 CHINA PATENT AGENT (H.K.) LTD.; 中国香港特别行政区 湾仔港湾道23号鹰君中心22号楼 22/F, Great Eagle Centre 23 Harbour Road, Wanchai Hong Kong, CN
Priority Data:
201620218013.018.03.2016CN
Title (EN) EVAPORATION MASK PLATE, METHOD FOR PATTERNING SUBSTRATE WITH SAME, AND DISPLAY SUBSTRATE
(FR) PLAQUE DE MASQUAGE D'ÉVAPORATION, PROCÉDÉ DE FORMATION DE MOTIFS SUR UN SUBSTRAT UTILISANT LADITE PLAQUE DE MASQUAGE, ET SUBSTRAT D'AFFICHAGE
(ZH) 蒸镀掩模板、使用其图案化基板的方法、以及显示基板
Abstract:
(EN) An evaporation mask plate (100) comprises a mask plate framework (10); a group of first mask strips (20), arranged on the mask plate framework (10) along a first direction; and a group of second mask strips (30), arranged on the group of first mask strips (20) along a second direction different from the first direction and each of the second mask strips (30) having a portion overlapped with the corresponding first mask strip (20) where a portion is embedded in the corresponding first mask strip (20) among the first mask strips (20). Also disclosed are a method for patterning a substrate with the evaporation mask plate (100) and an OLED display substrate made by using the method.
(FR) L'invention porte sur une plaque de masquage d'évaporation (100) comprenant : un cadre de plaque de masquage (10) ; un groupe de premières bandes de masquage (20), disposées sur le cadre de plaque de masquage (10) le long d'une première direction ; et un groupe de secondes bandes de masquage (30), disposées sur le groupe de premières bandes de masquage (20) le long d'une seconde direction différente de la première direction ; chacune des secondes bandes de masquage (30) possède une partie chevauchée par la première bande de masquage correspondante (20), une partie étant intégrée dans la première bande de masquage correspondante (20) parmi les premières bandes de masquage (20). L'invention concerne également un procédé de formation de motifs sur un substrat à l'aide de la plaque de masquage d'évaporation (100), ainsi qu'un substrat d'affichage à OLED fabriqué à l'aide du procédé.
(ZH) 一种蒸镀掩模板(100),包括掩模板框架(10);一组第一掩模条(20),沿第一方向布置于掩模板框架(10)上;以及一组第二掩模条(30),沿不同于第一方向的第二方向布置于一组第一掩模条(20)上,第二掩模条(30)中的每个具有与第一掩模条(20)重叠的部分,其中,部分被嵌入第一掩模条(20)中的相应第一掩模条(20)。还公开了使用该蒸镀掩模板(100)图案化基板的方法、以及使用该方法制造的有机发光二极管显示基板。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)