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1. (WO2017156758) SUBSTRATE HEAT TREATMENT APPARATUS

Pub. No.:    WO/2017/156758    International Application No.:    PCT/CN2016/076681
Publication Date: Fri Sep 22 01:59:59 CEST 2017 International Filing Date: Sat Mar 19 00:59:59 CET 2016
IPC: H01L 21/67
Applicants: ACM RESEARCH (SHANGHAI) INC.
Inventors: WANG, Hui
YANG, Hongchao
WU, Jun
WANG, Wenjun
CHEN, Fuping
FANG, Zhiyou
Title: SUBSTRATE HEAT TREATMENT APPARATUS
Abstract:
A substrate heat treatment apparatus for heat treating a substrate, comprising a bake plate, a plurality of support components, a baffle plate, and a driving device. The bake plate defines at least one gas passage. The plurality of support components support the substrate. The baffle plate is fixed on a top surface of the bake plate. The baffle plate surrounds the substrate and a gap is formed between an inner circumferential wall of the baffle plate and the substrate. A driving device drives the plurality of support components to move up or down. When heat treating the substrate, a hot gas is supplied to the space between the substrate and the top surface of the bake plate through the gas passage of the bake plate, and the hot gas flows out through the gap for-med between the inner circumferential wall of the baffle plate and the substrate.