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1. (WO2017156614) VACUUM ASSEMBLY FOR APPLYING THIN-FILM COATINGS AND METHOD FOR APPLYING OPTICAL COATINGS TO SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/156614 International Application No.: PCT/BY2016/000002
Publication Date: 21.09.2017 International Filing Date: 16.03.2016
IPC:
C23C 16/54 (2006.01) ,C23C 16/06 (2006.01) ,C23C 16/44 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
54
Apparatus specially adapted for continuous coating
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
06
characterised by the deposition of metallic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
Applicants:
ШИРИПОВ, Владимир Яковлевич SHIRIPOV, Vladimir Jakovlevich [BY/BY]; BY (AE, AG, AL, AO, AT, AU, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BZ, CA, CF, CG, CH, CI, CL, CM, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JP, KE, KM, KN, KP, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW)
ХОХЛОВ, Евгений Александрович KHOKHLOV, Evgeniy Aleksandrovich [BY/BY]; BY (AE, AG, AL, AO, AT, AU, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BZ, CA, CF, CG, CH, CI, CL, CM, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JP, KE, KM, KN, KP, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW)
ЯСЮНАС, Александр Алексеевич YASUNAS, Aleksander Alekseevich [BY/BY]; BY (AE, AG, AL, AO, AT, AU, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BZ, CA, CF, CG, CH, CI, CL, CM, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JP, KE, KM, KN, KP, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW)
МЯСНИКОВ, Константин Евгеньевич MIASNIKOU, Kanstantsin Evgenievich [BY/BY]; BY (AE, AG, AL, AO, AT, AU, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BZ, CA, CF, CG, CH, CI, CL, CM, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JP, KE, KM, KN, KP, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW)
НАСТОЧКИН, Сергей Михайлович NASTACHKIN, Siarhei Michailavich [BY/BY]; BY (AE, AG, AL, AO, AT, AU, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BZ, CA, CF, CG, CH, CI, CL, CM, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JP, KE, KM, KN, KP, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW)
ОБЩЕСТВО С ОГРАНИЧЕННОЙ ОТВЕТСТВЕННОСТЬЮ "ИЗОВАК ТЕХНОЛОГИИ" OBSCHESTVO S OGRANICHENNOY OTVETSTVENNOSTYU IZOVAK TEHNOLOGII [BY/BY]; ул. М.Богдановича, 155-907, Минск, M. Bogdanovicha ul., 155-907 Minsk, 220040, BY (AM, AZ, BY, CN, KG, KR, KZ, MD, RU, TJ, TM)
Inventors:
ШИРИПОВ, Владимир Яковлевич SHIRIPOV, Vladimir Jakovlevich; BY
ХОХЛОВ, Евгений Александрович KHOKHLOV, Evgeniy Aleksandrovich; BY
ЯСЮНАС, Александр Алексеевич YASUNAS, Aleksander Alekseevich; BY
МЯСНИКОВ, Константин Евгеньевич MIASNIKOU, Kanstantsin Evgenievich; BY
НАСТОЧКИН, Сергей Михайлович NASTACHKIN, Siarhei Michailavich; BY
Priority Data:
Title (EN) VACUUM ASSEMBLY FOR APPLYING THIN-FILM COATINGS AND METHOD FOR APPLYING OPTICAL COATINGS TO SAME
(FR) APPAREIL À VIDE POUR APPLIQUER DES REVÊTEMENTS À FILM MINCE ET PROCÉDÉ D’APPLICATION DE REVÊTEMENTS OPTIQUES
(RU) ВАКУУМНАЯ УСТАНОВКА ДЛЯ НАНЕСЕНИЯ ТОНКОПЛЕНОЧНЫХ ПОКРЫТИЙ И СПОСОБ НАНЕСЕНИЯ НА НЕЙ ОПТИЧЕСКИХ ПОКРЫТИЙ
Abstract:
(EN) The group of inventions relates to a vacuum process assembly and to a method for applying thin-film coatings having given optical characteristics to same. The indicated vacuum assembly includes an airlock chamber which is affixed to a transport system and which is capable of moving with a vertically-disposed drum-type substrate-holder inside same or without same, and of docking with a process chamber by means of a horizontal high-vacuum shutter located under the process chamber. The application of thin-film optical coatings is carried out in working zones of the process chamber by means of chemical deposition in high-density plasma, wherein, the application of coatings involves a plasma generation system in which sources of induction discharge are disposed along a vertical axis, and the working space is divided into working zones by means of high-vacuum pumping means and protective screens. The invention allows for the compact disposition of equipment and for a high-performance and economical method of applying thin-film optical coatings, having high consumer properties, onto flexible and solid substrates of various types and dimensions.
(FR) Le groupe d’inventions concerne un appareil technologique à vide et un procédé d’application de revêtements minces possédant des caractéristiques optiques désirées. Cet appareil à vide comprend un sas monté sur le système de transport et réalisé de manière à pouvoir se déplacer avec un support de substrat de type tambour disposé verticalement, à l’intérieur ou à l’extérieur du sas, tout en assurant la jonction avec la chambre de traitement via une chambre tampon à vide poussé disposé sous la chambre de traitement. L’application de revêtements optiques mincies s’effectue dans des zones de travail de la chambre de traitement par procédé de dépôt chimique dans le plasma haute densité, et on utilise pour l’application de revêtements un système de génération de plasma dans lequel les sources de décharge par induction sont disposées le long d’un axe vertical, et la séparation de l’espace de travail en zones de travail a été réalisée grâce à des moyens d’évacuation par pompage à vide poussé et à des écrans de protection. L’invention permet d'assurer la disposition compacte des appareils et la réalisation d’un procédé économique et rentable d’application de films optiques mincies présentant des propriétés élevées en termes de consommation sur des substrats souples ou solides de différentes dimensions type.
(RU) Группа изобретений относится к вакуумной технологической установке и способу нанесения на ней тонкопленочных покрытий с заданными оптическими характеристиками. Указанная вакуумная установка включает шлюзовую камеру, закрепленную на транспортной системе и выполненную с возможностью перемещения с вертикально расположенным подложкодержателем барабанного типа внутри или без него и стыковки с технологической камерой через горизонтальный высоковакуумный затвор, расположенный под технологической камерой. Нанесение тонкопленочных оптических покрытий проводится в рабочих зонах технологической камеры методом химического осаждения в плазме высокой плотности, при этом для нанесения покрытий используют систему генерации плазмы, в которой источники индукционного разряда расположены вдоль вертикальной оси, а разделение рабочего пространства на рабочие зоны выполнено посредством высоковакуумных средств откачки и защитных экранов. Обеспечивается возможность компактного размещения оборудования и осуществления высокопроизводительного и экономичного способа нанесения тонкопленочных оптических покрытий с высокими потребительскими свойствами на гибкие и твердые подложки различных типоразмеров.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Russian (RU)
Filing Language: Russian (RU)