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1. (WO2017155340) OPTICAL FILM HAVING MICROSTRUCTURE AND METHOD FOR MANUFACTURING SAME
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Pub. No.: WO/2017/155340 International Application No.: PCT/KR2017/002589
Publication Date: 14.09.2017 International Filing Date: 09.03.2017
IPC:
G02B 27/00 (2006.01) ,G01N 21/88 (2006.01) ,G02B 6/42 (2006.01)
[IPC code unknown for G02B 27][IPC code unknown for G01N 21/88][IPC code unknown for G02B 6/42]
Applicants:
광주과학기술원 GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY [KR/KR]; 광주시 북구 첨단과기로 123 123, Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KR
Inventors:
박성주 PARK, Seongju; KR
임용철 LEEM, Youngchul; KR
정세희 JEONG, Sehee; KR
안선용 AN, Seonyong; KR
Agent:
특허법인 이상 E-SANG PATENT & TRADEMARK LAW FIRM; 서울시 서초구 바우뫼로 188, 3층 3F., 188, Baumoe-ro, Seocho-gu, Seoul 06747, KR
Priority Data:
10-2016-002860510.03.2016KR
Title (EN) OPTICAL FILM HAVING MICROSTRUCTURE AND METHOD FOR MANUFACTURING SAME
(FR) FILM OPTIQUE COMPORTANT UNE MICROSTRUCTURE ET PROCÉDÉ DE FABRICATION ASSOCIÉ
(KO) 미세 구조를 가지는 광학 필름 및 이의 제조방법
Abstract:
(EN) Disclosed are an optical film having a periodical/hierarchical micro surface structure and a method for manufacturing the same. A hemispherical mask pattern is formed through a reflow of a photoresist pattern, and the same is etched to form a hemispherical pattern on a substrate. In addition, nanobeads are formed on the front surface of the substrate on which the hemispherical pattern is formed, nanoprotrusions are formed through etching, and a master substrate is formed therethrough. A mold material is applied on the master substrate, and a reverse-phased replication substrate is formed through curing. Introduction of the replication substrate forms an optical film having a hemispherical pattern and nanoprotrusions on the surface thereof.
(FR) L'invention concerne un film optique comportant une microstructure de surface périodique/hiérarchique et un procédé de fabrication associé. Un motif de masque hémisphérique est formé par refusion d'un motif de résine photosensible, lequel est gravé pour former un motif hémisphérique sur un substrat. De plus, des nanobilles sont formées sur la surface avant du substrat sur lequel le motif hémisphérique est formé, des nanosaillies sont formées par gravure, et un substrat maître est formé au travers. Un matériau de moule est appliqué sur le substrat maître, et un substrat de réplication à phase inverse est formé par durcissement. L'introduction du substrat de réplication forme un film optique ayant un motif hémisphérique et des nanosaillies sur sa surface.
(KO) 기적 계층적인 미세 표면 구조를 가지는 광학필름 및 이를 제조하기 위한 방법이 개시된다. 포토레지스트 패턴의 리플로우를 통해 반구형 마스크 패턴이 형성되고, 이에 대한 식각을 통해 기판 상에는 반구형 패턴이 형성된다. 또한, 나노구슬은 반구형 패턴이 형성된 기판의 전면에 배치되고, 식각을 통해 나노돌기가 형성되고, 이를 통해 마스터 기판이 형성된다. 마스터 기판 상에 몰드 재료가 도포되고 경화를 통해 역상의 복제용 기판이 형성된다. 복제용 기판의 도입을 통해 표면에 반구형 패턴과 나노돌기를 가지는 광학필름이 형성된다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)