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1. (WO2017154921) STEP SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS
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Pub. No.: WO/2017/154921 International Application No.: PCT/JP2017/009054
Publication Date: 14.09.2017 International Filing Date: 07.03.2017
IPC:
G03F 7/11 (2006.01) ,G03F 7/20 (2006.01) ,G03F 7/26 (2006.01) ,H01L 21/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants:
日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors:
遠藤 貴文 ENDO, Takafumi; JP
橋本 圭祐 HASHIMOTO, Keisuke; JP
西巻 裕和 NISHIMAKI, Hirokazu; JP
田村 護 TAMURA, Mamoru; JP
坂本 力丸 SAKAMOTO, Rikimaru; JP
▲徳▼永 光 TOKUNAGA, Hikaru; JP
Agent:
特許業務法人はなぶさ特許商標事務所 HANABUSA PATENT & TRADEMARK OFFICE; 東京都千代田区神田駿河台3丁目2番地 新御茶ノ水アーバントリニティ Shin-Ochanomizu Urban Trinity, 2, Kandasurugadai 3-chome, Chiyoda-ku, Tokyo 1010062, JP
Priority Data:
2016-04706510.03.2016JP
2017-00515016.01.2017JP
Title (EN) STEP SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS
(FR) COMPOSITION DE REVÊTEMENT DE SUBSTRAT ÉTAGÉ INCLUANT UN COMPOSÉ AYANT UN GROUPE DE PHOTORÉTICULATION EN RAISON D'UNE LIAISON INSATURÉE ENTRE DES ATOMES DE CARBONE
(JA) 炭素原子間の不飽和結合による光架橋基を有する化合物を含む段差基板被覆組成物
Abstract:
(EN) [Problem] To provide a step substrate coating composition for forming a coating having the quality of filling and flattening a pattern. [Solution] A photocurable step substrate coating composition that includes a solvent (F) and a compound (E) that includes a partial structure (I) and a partial structure (II), the partial structure (II) including a hydroxy group occurring due to the reaction of an epoxy group and a proton-generating compound, wherein the partial structure (I) is at least one partial structure selected from the group comprising formulas (1-1) to (1-5), or a partial structure comprising a combination of formula (1-6) and formula (1-7) or (1-8), and the partial structure (II) is the partial structure of formula (2-1) or (2-2). Also, in the compound (E), the epoxy group and the hydroxy group are included in a molar ratio such that 0 ≤ (epoxy group)/(hydroxy group) ≤ 0.5, and the partial structure (II) is included in a molar ratio such that 0.01 ≤ (partial structure (II)/(partial structure (I) + partial structure (II)) ≤ 0.8.
(FR) Le problème décrit par l'invention est de pourvoir à une composition de revêtement de substrat étagé qui permet de former un revêtement ayant une qualité de remplissage et d'aplatissement d'un motif. La solution selon l'invention porte sur une composition de revêtement de substrat étagé photodurcissable qui comprend un solvant (F) et un composé (E) comportant une structure partielle (I) et une structure partielle (II), la structure partielle (II) incluant un groupe hydroxy qui apparaît en raison de la réaction d'un groupe époxy et d'un composé générateur de protons. La structure partielle (I) est au moins une structure partielle qui est choisie dans le groupe comprenant les formules (1-1) à (1-5), ou une structure partielle qui comporte une combinaison de la formule (1-6) et des formules (1-7) ou (1-8), et la structure partielle (II) est la structure partielle des formules (2-1) ou (2-2). De plus, dans le composé (E), le groupe époxy et le groupe hydroxy présentent un rapport molaire tel que 0 ≤ (groupe époxy)/(groupe hydroxy) ≤ 0,5, et la structure partielle (II) présente un rapport molaire tel que 0,01 ≤ (structure partielle (II)/(structure partielle (I) + structure partielle (II)) ≤ 0,8.
(JA) 【課題】 パターンへの充填性と平坦化性を有する被膜を形成する段差基板被覆組成物を提供する。 【解決手段】 部分構造(I)と部分構造(II)とを含む化合物(E)及び溶剤(F)を含み、且つ該部分構造(II)がエポキシ基とプロトン発生化合物の反応により生じたヒドロキシ基を含む光硬化性段差基板被覆組成物であって、該部分構造(I)は下記式(1-1)乃至式(1-5)からなる群より選ばれる少なくとも一つの部分構造、又は式(1-6)と式(1-7)若しくは式(1-8)との組み合わせからなる部分構造であり、部分構造(II)は下記式(2-1)又は式(2-2)の部分構造である上記組成物。また、化合物(E)中、エポキシ基とヒドロキシ基とを0≦(エポキシ基)/(ヒドロキシ基)≦0.5となるモル比で含み、部分構造(II)を0.01≦(部分構造(II))/(部分構造(I)+部分構造(II))≦0.8となるモル比で含む上記組成物。
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African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)