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1. (WO2017154888) SPUTTERING TARGET CAPABLE OF STABILIZING IGNITION

Pub. No.:    WO/2017/154888    International Application No.:    PCT/JP2017/008959
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Wed Mar 08 00:59:59 CET 2017
IPC: C23C 14/34
Applicants: JX NIPPON MINING & METALS CORPORATION
JX金属株式会社
Inventors: MURATA Shuhei
村田 周平
Title: SPUTTERING TARGET CAPABLE OF STABILIZING IGNITION
Abstract:
A sputtering target in which a sputter face is provided with a flat section and a tapered section, wherein the sputtering target is characterized in that the tapered section has a crystal strain corresponding to an average KAM value of 0.5° or greater. The present invention makes it possible to lower the lighting failure rate during ignition (plasma lighting), and initiate the sputtering process consistently. Device downtime can thereby be shortened, contributing to improved throughput and enhanced cost performance.