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1. (WO2017154741) FEPT-C-BASED SPUTTERING TARGET
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Pub. No.: WO/2017/154741 International Application No.: PCT/JP2017/008344
Publication Date: 14.09.2017 International Filing Date: 02.03.2017
Chapter 2 Demand Filed: 01.11.2017
IPC:
C23C 14/34 (2006.01) ,C22C 1/04 (2006.01) ,C22C 5/04 (2006.01) ,C22C 38/00 (2006.01) ,G11B 5/851 (2006.01) ,B22F 1/00 (2006.01) ,B22F 3/14 (2006.01) ,B22F 3/15 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
1
Making non-ferrous alloys
04
by powder metallurgy
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
5
Alloys based on noble metals
04
Alloys based on a platinum group metal
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
38
Ferrous alloys, e.g. steel alloys
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
851
Coating a support with a magnetic layer by sputtering
B PERFORMING OPERATIONS; TRANSPORTING
22
CASTING; POWDER METALLURGY
F
WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
1
Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition
B PERFORMING OPERATIONS; TRANSPORTING
22
CASTING; POWDER METALLURGY
F
WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3
Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12
Both compacting and sintering
14
simultaneously
B PERFORMING OPERATIONS; TRANSPORTING
22
CASTING; POWDER METALLURGY
F
WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3
Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12
Both compacting and sintering
14
simultaneously
15
Hot isostatic pressing
Applicants:
田中貴金属工業株式会社 TANAKA KIKINZOKU KOGYO K.K. [JP/JP]; 東京都千代田区丸の内2丁目7-3 東京ビルディング TOKYO BUILDING, 7-3, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1006422, JP
Inventors:
後藤 康之 GOTO, Yasuyuki; JP
山本 孝充 YAMAMOTO, Takamichi; JP
西浦 正紘 NISHIURA, Masahiro; JP
櫛引 了輔 KUSHIBIKI, Ryousuke; JP
Agent:
松山 圭佑 MATSUYAMA, Keisuke; JP
高矢 諭 TAKAYA, Satoshi; JP
牧野 剛博 MAKINO, Takehiro; JP
藤田 崇 FUJITA, Takashi; JP
Priority Data:
2016-04388807.03.2016JP
Title (EN) FEPT-C-BASED SPUTTERING TARGET
(FR) CIBLE DE PULVÉRISATION À BASE DE FEPT-C
(JA) FePt-C系スパッタリングターゲット
Abstract:
(EN) Through the present invention, a thin film including a FePt-based alloy usable as a magnetic recording medium can be independently formed, and the quantity of particles can be further reduced. A FePt-C-based sputtering target containing Fe, Pt, and C, having a structure in which a C phase essentially comprising C is dispersed in a FePt-based alloy phase which contains 33 mol% to 60 mol% Pt, the remainder essentially comprising Fe, the average value of a size index a of the C phase being 4.0 µm to 9.0 µm, and the average value of a nonspherical index b of the C phase being 3.0 or greater.
(FR) La présente invention permet de former de manière indépendante un film mince comprenant un alliage à base de FePt utilisable en tant que support d'enregistrement magnétique, et de réduire davantage la quantité de particules. La cible de pulvérisation à base de FePt-C contient Fe, Pt et C, présente une structure dans laquelle une phase C comprenant essentiellement C est dispersée dans une phase d'alliage à base de FePt, laquelle contient 33% en moles à 60% en moles de Pt, le reste comprenant essentiellement Fe, la valeur moyenne d'un indice de taille a de la phase C étant comprise entre 4,0 µm et 9,0 µm, et la valeur moyenne d'un indice non sphérique b de la phase C étant supérieure ou égale à 3,0.
(JA) 磁気記録媒体として使用可能なFePt系合金を含む薄膜を単独で形成することができ、かつ、パーティクルをさらに少なくすることができるようにする。 Fe、PtおよびCを含有するFePt-C系スパッタリングターゲットであって、Ptを33mol%以上60mol%以下含有して残部が実質的にFeからなるFePt系合金相中に、実質的にCからなるC相が分散した構造を有し、C相の大きさ指数aの平均値が4.0μm以上9.0μm以下であり、かつ、C相の非球形指数bの平均値が3.0以上である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)