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1. (WO2017154740) HIGH-PURITY TIN AND METHOD FOR PRODUCING SAME
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Pub. No.: WO/2017/154740 International Application No.: PCT/JP2017/008342
Publication Date: 14.09.2017 International Filing Date: 02.03.2017
IPC:
C25C 1/14 (2006.01) ,C22C 13/00 (2006.01) ,C25C 7/04 (2006.01) ,C25C 7/06 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
C
PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
1
Electrolytic production, recovery or refining of metals by electrolysis of solutions
14
of tin
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
13
Alloys based on tin
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
C
PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
7
Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
04
Diaphragms; Spacing elements
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
C
PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
7
Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
06
Operating or servicing
Applicants:
JX金属株式会社 JX NIPPON MINING & METALS CORPORATION [JP/JP]; 東京都千代田区大手町一丁目1番2号 1-2,Otemachi 1-chome,Chiyoda-ku, Tokyo 1008164, JP
Inventors:
伊森 徹 IMORI,Toru; JP
竹本 幸一 TAKEMOTO,Koichi; JP
Agent:
アクシス国際特許業務法人 AXIS PATENT INTERNATIONAL; 東京都港区新橋二丁目6番2号 新橋アイマークビル Shimbashi i-mark Bldg., 6-2 Shimbashi 2-Chome,Minato-ku, Tokyo 1050004, JP
Priority Data:
2016-04606009.03.2016JP
Title (EN) HIGH-PURITY TIN AND METHOD FOR PRODUCING SAME
(FR) ÉTAIN DE HAUTE PURETÉ ET SON PROCÉDÉ DE PRODUCTION
(JA) 高純度錫及びその製造方法
Abstract:
(EN) Provided is high-purity tin having a purity of 5N (99.999 mass%) or higher, wherein the high-purity tin has particles suppressed by high-purity tin that has 50,000 or fewer particles having a grain size of 0.5 μm or greater per 1 g.
(FR) L'invention concerne de l'étain de haute pureté qui présente une pureté supérieure ou égale à 5N (99,999 % en poids), lequel étain de haute pureté comporte des particules supprimées par de l'étain de haute pureté qui a au plus 50 000 particules présentant une taille de grain supérieure ou égale à 0,5 µm par gramme.
(JA) 純度が5N(99.999質量%)以上である高純度錫であって、粒径が0.5μm以上のパーティクルが1g中に50,000個以下である高純度錫によってパーティクルの抑制された高純度錫を提供する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)