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1. (WO2017154673) SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, SUBSTRATE PROCESSING DEVICE, AND SUBSTRATE DRYING DEVICE

Pub. No.:    WO/2017/154673    International Application No.:    PCT/JP2017/007836
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Wed Mar 01 00:59:59 CET 2017
IPC: H01L 21/304
Applicants: EBARA CORPORATION
株式会社荏原製作所
Inventors: ISHIBASHI Tomoatsu
石橋 知淳
Title: SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, SUBSTRATE PROCESSING DEVICE, AND SUBSTRATE DRYING DEVICE
Abstract:
Provided are a substrate cleaning device, a substrate cleaning method, a substrate processing device, and a substrate drying device that exhibit superior performance. The substrate cleaning device comprises: a substrate-holding rotary mechanism that holds and rotates the substrate; a first cleaning mechanism that brings a cleaning tool into contact with the substrate and cleans the substrate, or that uses a two-stream fluid jet to clean the substrate, or that uses ozone water to clean the substrate; and a second cleaning mechanism that uses an ultrasonic cleaning solution to clean the substrate.