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1. (WO2017154515) ANTISTATIC MATERIAL, METHOD FOR PRODUCING SAME, AND ANTISTATIC FILM

Pub. No.:    WO/2017/154515    International Application No.:    PCT/JP2017/005864
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Sat Feb 18 00:59:59 CET 2017
IPC: C09K 3/16
C08G 59/20
C08G 77/04
Applicants: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
パナソニックIPマネジメント株式会社
Inventors: TOYOTA Kei
豊田 慶
OIKAWA Kazuma
及川 一摩
Title: ANTISTATIC MATERIAL, METHOD FOR PRODUCING SAME, AND ANTISTATIC FILM
Abstract:
This antistatic material comprises a mixture of: a first alkoxysilane including at least one alkoxy group and at least one polymerizable organic functional group; a second alkoxysilane that includes at least one alkoxy group and that does not include a polymerizable organic functional group; a solvent; an acidic catalyst; and an ionic compound.