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1. (WO2017154439) METHOD FOR MANUFACTURING POLYMER, METHOD FOR MANUFACTURING NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIN FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND POLYMER
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Pub. No.: WO/2017/154439 International Application No.: PCT/JP2017/004199
Publication Date: 14.09.2017 International Filing Date: 06.02.2017
IPC:
C08F 8/14 (2006.01) ,C08F 22/06 (2006.01) ,C08F 220/08 (2006.01) ,G03F 7/038 (2006.01) ,G03F 7/20 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
14
Esterification
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
22
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
04
Anhydrides, e.g. cyclic anhydrides
06
Maleic anhydride
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
08
Anhydrides
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
住友ベークライト株式会社 SUMITOMO BAKELITE CO., LTD. [JP/JP]; 東京都品川区東品川2丁目5番8号 5-8, Higashi-Shinagawa 2-chome, Shinagawa-ku, Tokyo 1400002, JP
Inventors:
池田 陽雄 IKEDA Haruo; JP
大西 治 ONISHI Osamu; JP
Agent:
速水 進治 HAYAMI Shinji; JP
Priority Data:
2016-04421408.03.2016JP
Title (EN) METHOD FOR MANUFACTURING POLYMER, METHOD FOR MANUFACTURING NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIN FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND POLYMER
(FR) PROCÉDÉ DE FABRICATION DE POLYMÈRE, PROCÉDÉ DE FABRICATION DE COMPOSITION DE RÉSINE PHOTOSENSIBLE DE TYPE NÉGATIF, PROCÉDÉ DE FABRICATION DE FILM DE RÉSINE, PROCÉDÉ DE FABRICATION DE DISPOSITIF ÉLECTRONIQUE, ET POLYMÈRE
(JA) ポリマーの製造方法、ネガ型感光性樹脂組成物の製造方法、樹脂膜の製造方法、電子装置の製造方法およびポリマー
Abstract:
(EN) This method for manufacturing a polymer includes a step for preparing a precursor polymer including structural units represented by formula (1a), a step for applying water or an alcohol represented by the formula R1-OH (where R1 is a C1-18 organic group) to the precursor polymer including structural units represented by formula (1a) to cause ring opening of maleic anhydride portions of the structural units represented by formula (1a) and generating a carboxyl group or a salt thereof in the precursor polymer, and a step for reacting a compound provided with an epoxy group represented by formula (3) with the precursor polymer in which maleic anhydride portions are ring-opened. (In formula (3), R2 represents a C2-18 organic group and has a carbon-carbon double bond in the structure thereof.)
(FR) L’invention concerne un procédé de fabrication d’un polymère comprenant une étape de préparation d’un polymère précurseur comportant des unités structurelles représentées par une formule (1a), une étape d’application d’eau ou d’un alcool représenté par la formule R1-OH (R1 étant un groupe organique en C1-18) au polymère précurseur comportant des unités structurelles représentées par la formule (1a) pour provoquer une ouverture de cycle des parties anhydride maléique des unités structurelles représentées par la formule (1a) et la génération d’un groupe carboxyle ou de son sel dans le polymère précurseur, et une étape de réaction d’un composé doté d’un groupe époxy représenté par une formule (3) avec le polymère précurseur dans lequel des parties anhydride maléique présentent des cycles ouverts. (Dans la formule (3), R2 représente un groupe organique en C2-18 et présente une double liaison carbone–carbone dans sa structure.)
(JA) 本発明のポリマーの製造方法は、以下の式(1a)で示される構造単位を含む前駆体ポリマーを準備する工程と、式(1a)で示される構造単位を含む前記前駆体ポリマーに対し、R-OHで表されるアルコール(ただし、Rは炭素数1~18の有機基である。)または水を作用させ、式(1a)で示される構造単位の無水マレイン酸部位を開環させ、前記前駆体ポリマー中にカルボキシル基またはその塩を生成させる工程と、無水マレイン酸部位を開環させた前記前駆体ポリマーに対し、式(3)で示されるエポキシ基を備える化合物を反応させる工程と、を含む。 (式(3)中、Rは炭素数2~18の有機基であって、その構造中に炭素-炭素二重結合を有する。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)