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1. (WO2017153725) PLASMA DEPOSITION METHOD

Pub. No.:    WO/2017/153725    International Application No.:    PCT/GB2017/050590
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Tue Mar 07 00:59:59 CET 2017
IPC: C23C 16/30
C23C 16/44
C23C 16/505
H01J 37/32
Applicants: SEMBLANT LIMITED
Inventors: SINGH, Shailendra Vikram
LIONE, Richard Anthony
Title: PLASMA DEPOSITION METHOD
Abstract:
A plasma deposition method in which a cover layer is deposited onto the internal walls of an empty plasma chamber by plasma deposition of a precursor mixture comprising (i) one or more hydrocarbon compounds of formula (A), or (ii) one or more C1-C3 alkane, C2-C3 alkene or C2-C3 alkyne compounds: (Formula (A)) wherein: Z1 represents C1-C3 alkyl or C2-C3 alkenyl; Z2 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z3 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z4 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z5 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; and Z6 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl.