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1. (WO2017153680) DEVICE FOR MODULATING THE INTENSITY OF A PARTICLE BEAM FROM A CHARGED PARTICLE SOURCE
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Pub. No.: WO/2017/153680 International Application No.: PCT/FR2017/050510
Publication Date: 14.09.2017 International Filing Date: 08.03.2017
IPC:
H01J 27/02 (2006.01) ,H01J 37/05 (2006.01) ,G21K 1/02 (2006.01) ,H05H 7/04 (2006.01) ,H05H 7/08 (2006.01)
[IPC code unknown for H01J 27/02][IPC code unknown for H01J 37/05][IPC code unknown for G21K 1/02][IPC code unknown for H05H 7/04][IPC code unknown for H05H 7/08]
Applicants:
PANTECHNIK [FR/FR]; 13 rue de la Résistance 14400 Bayeux, FR
A.D.A.M. SA [CH/CH]; Louis-Casaï 18 c/o Regus Business Center 1209 Genève, CH
Inventors:
SALOU, Pierre; FR
FINK, Daniel; FR
Agent:
BREESE, Pierre; FR
Priority Data:
165191208.03.2016FR
Title (EN) DEVICE FOR MODULATING THE INTENSITY OF A PARTICLE BEAM FROM A CHARGED PARTICLE SOURCE
(FR) DISPOSITIF DE MODULATION DE L'INTENSITE D'UN FAISCEAU DE PARTICULES D'UNE SOURCE DE PARTICULES CHARGEES
Abstract:
(EN) A device for modulating the intensity of a charged particle beam emitted along an axis (A0), comprising: 4xN consecutive deflection systems (21, 22, 23, 24), with N = 1 or 2, the deflection systems (21, 22, 23, 24) being positioned along the axis (A0) of said particle beam; for each deflection system ((21, 22, 23, 24), means for applying a force for deflecting the beam and for varying the applied force; two collimators (41, 42), each having a slot (61, 62) with an opening that increases in width from the centre towards the periphery, located respectively between the first and second deflection systems and between the third and fourth deflection systems, the openings of the slots ((61) (62) of the collimators (41) facing towards opposite sides of the emission axis A0 of the beam.
(FR) Dispositif de modulation de l'intensité d'un faisceau de particules chargées émis suivant un axe (A0), comprenant : • 4xN systèmes de déviation successifs (21, 22, 23, 24), avec N = 1 ou 2, les systèmes de déviation (2i, 22, 23, 24) étant placés le long de l'axe (A0) dudit faisceau de particules. • des moyens d'application d'une force de déviation du faisceau pour chaque système de déviation (21, 22, 23, 24) et de variation de la force appliquée · deux collimateurs (41, 42) présentant chacun une fente (61, 62) avec une ouverture de largeur croissante du centre vers la périphérie, placés respectivement entre le premier et le deuxième système de déviation et entre le troisième et quatrième système de déviation, les ouvertures des fentes (61) (62) des collimateurs (41) étant orientées vers des côtés opposés de l'axe d'émission du faisceau A0.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)