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1. (WO2017153638) APPARATUS AND METHOD

Pub. No.:    WO/2017/153638    International Application No.:    PCT/FI2017/050159
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Sat Mar 11 00:59:59 CET 2017
IPC: C23C 16/455
Applicants: BENEQ OY
Inventors: BOSUND, Markus
Title: APPARATUS AND METHOD
Abstract:
The invention relates to an apparatus (1) and method for subjecting a surface of a substrate (13) to successive surface reactions of at least a first precursor and a second precursor according to the principles of atomic layer deposition. The apparatus comprising: a reaction chamber (50) defining a reaction space (6), one or more gas inlets (8), one or more gas outlets (12) and a plasma discharge electrode (16). The apparatus further comprises an grounded grid sheet (21) having openings (23) and arranged within the reaction space (6) opposite the plasma discharge electrode (16).