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1. (WO2017153356) DEVICE FOR DEPOSITING THIN LAYERS

Pub. No.:    WO/2017/153356    International Application No.:    PCT/EP2017/055224
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Tue Mar 07 00:59:59 CET 2017
IPC: C23C 16/54
C23C 16/455
C23C 16/458
Applicants: FOFITEC AG
Inventors: FISCHER, Jules
BERNHARD, Andreas
Title: DEVICE FOR DEPOSITING THIN LAYERS
Abstract:
The subject of the invention is a device for depositing thin layers on a substrate (FB) by way of at least two self-limiting surface reactions (ALD/MLD), wherein the device has a coating plate (1) and a counterpart plate (2) arranged opposite the latter and likewise in the form of a coating plate, wherein the coating plate has a plurality of supply regions and discharge regions for reaction gas and flushing gas and the counterpart plate has at least one supply region for flushing gas or air, wherein means (R1, R2; U1, U2) are provided for also moving two of the film webs through between the two plates, and wherein the supplied gases form gas cushions which support the at least one film web against the two plates on passing through between the latter and keep said film web at a distance therefrom. The two plates are mounted so as to be movable with respect to one another at a variable distance determined by the pressure of the gas cushions with respect to an opposing force, and are formed, at least in a supply region, in a porous manner for gas to escape in a manner distributed extensively over this region.