Search International and National Patent Collections

1. (WO2017153130) ILLUMINATION SYSTEM AND METROLOGY SYSTEM

Pub. No.:    WO/2017/153130    International Application No.:    PCT/EP2017/053257
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Wed Feb 15 00:59:59 CET 2017
IPC: G03F 7/20
G02B 5/20
Applicants: ASML NETHERLANDS B.V.
Inventors: DE WIT, Johannes, Matheus, Marie
FEIJEN, Kim, Gerard
SIJBEN, Anko, Jozef, Cornelus
MAASSEN, Martinus
VAN DE GROES, Henricus, Martinus, Johannes
Title: ILLUMINATION SYSTEM AND METROLOGY SYSTEM
Abstract:
Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.