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1. (WO2017153104) ELECTRON SOURCE FOR A FREE ELECTRON LASER

Pub. No.:    WO/2017/153104    International Application No.:    PCT/EP2017/052620
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Wed Feb 08 00:59:59 CET 2017
IPC: H01J 37/073
H05H 9/00
H01S 3/09
Applicants: ASML NETHERLANDS B.V.
Inventors: NIKIPELOV, Andrey, Alexandrovich
BRUSSAARD, Gerrit, Jacobus, Hendrik
ENGELEN, Wouter, Joep
Title: ELECTRON SOURCE FOR A FREE ELECTRON LASER
Abstract:
An electron source, e.g. for a free electron laser used for EUV lithography comprises: • a cathode (203) configured to be connected to a negative potential (100, 101); • a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; • an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and • a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.