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1. (WO2017153085) MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Pub. No.: WO/2017/153085 International Application No.: PCT/EP2017/051603
Publication Date: 14.09.2017 International Filing Date: 26.01.2017
IPC:
G03F 7/20 (2006.01) ,G03F 1/84 (2012.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68
Preparation processes not covered by groups G03F1/20-G03F1/5096
82
Auxiliary processes, e.g. cleaning
84
Inspecting
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
NIENHUYS, Han-Kwang; NL
NAKIBOGLU, Günes; NL
PETIT, Rita, Marguerite, Albin, Lambertine; NL
PEN, Hermen, Folken; NL
VAN DE MOESDIJK, Remco, Yuri; NL
VAN BOXTEL, Frank, Johannes, Jacobus; NL
KRUIZINGA, Borgert; NL
Agent:
SIEM, Max Yoe Shé; NL
Priority Data:
16159723.210.03.2016EP
Title (EN) MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) SYSTÈME DE MESURE, APPAREIL LITHOGRAPHIQUE, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
Abstract:
(EN) A measurement system to determine a deformation of an object having a front surface and a back surface and being provided with a pattern is described, the measurement system comprising: ∙ a processor and ∙ an interferometer system comprising a light source and a detector system; the light source being configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively; the detector system being configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor; the processor being configured to: ∙ receive the signals; ∙ determine, based on the signals as received, a characteristic of the object; and ∙ determine a deformation of the pattern based on the characteristic.
(FR) L'invention concerne un système de mesure pour déterminer une déformation d'un objet ayant une surface avant et une surface arrière et comprenant un motif, le système de mesure comprenant : ∙ un processeur, et ∙ un système d'interféromètre comprenant une source de lumière et un système de détecteur ; la source de lumière étant configurée pour émettre, vers chacun d'une pluralité d'emplacements sur l'objet, des faisceaux de mesure afin de générer, à chacun de la pluralité d'emplacements respectifs, des faisceaux de mesure réfléchis depuis les surfaces avant et arrière de l'objet, respectivement ; le système de détecteur étant configuré pour recevoir les faisceaux de mesure réfléchis respectifs et délivrer des signaux représentant les faisceaux de mesure réfléchis reçus au processeur ; le processeur étant configuré pour : ∙ recevoir les signaux ; ∙ déterminer, sur la base des signaux reçus, une caractéristique de l'objet ; et ∙ déterminer une déformation du motif sur la base de la caractéristique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)