Search International and National Patent Collections

1. (WO2017152859) INTRAMEDULLARY NAIL POSITIONING SYSTEM

Pub. No.:    WO/2017/152859    International Application No.:    PCT/CN2017/076188
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Fri Mar 10 00:59:59 CET 2017
IPC: A61B 17/72
A61B 17/90
Applicants: WUHAN DRAGONBIO ORTHOPEDIC PRODUCTS CO., LTD.
武汉德骼拜尔外科植入物有限公司
Inventors: LIU, Yuhan
刘宇晗
YAN, Zhongliang
严忠良
XIANG, Yuan
向愿
YANG, Xinxing
杨新星
LIU, Xixi
刘茜茜
Title: INTRAMEDULLARY NAIL POSITIONING SYSTEM
Abstract:
Disclosed is an intramedullary nail positioning system, comprising an intramedullary nail (6), a sight bracket (2), a handle (1), a positioning rod (5), a fixture block (4) and a lock screw plug (3), wherein a positioning platform (62) and a lock hole (61) are arranged at a distal end of the intramedullary nail (6), a positioning hole (60) is provided in the positioning platform (62), the lock hole (61) and the positioning hole (60) extend in different directions, the distal end of the positioning rod (5) is provided with a positioning portion (51), an abutting portion (52) is arranged adjacent to the positioning portion (51), the positioning rod (5) is further provided with a slot (53), the positioning portion (51) of the positioning rod (5) is received in the positioning hole (60), the abutting portion (52) of the positioning rod (5) abuts against the positioning platform (62), the fixture block (4) is arranged in the slot (53), and with the distance between the centre of the lock hole (61) and the sight bracket (2) being L, the distance between the centre of the lock hole (61) and the positioning platform (62) being L1, the distance between the abutting portion (52) and the slot (53) being L2, and the height of the fixture block (4) being L3, then L=L1+L2+L3, where L, L1, L2 and L3 are all fixed values. By setting L1, L2 and L3 as fixed values, the compatibility of the elements of the intramedullary nail positioning system is improved, and the risk of mismatching is reduced.