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1. (WO2017152581) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/152581 International Application No.: PCT/CN2016/095290
Publication Date: 14.09.2017 International Filing Date: 15.08.2016
IPC:
G02F 1/1362 (2006.01) ,G02F 1/1368 (2006.01) ,H01L 21/77 (2017.01) ,H01L 27/12 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
136
Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
1362
Active matrix addressed cells
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
136
Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
1362
Active matrix addressed cells
1368
in which the switching element is a three-electrode device
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
12
the substrate being other than a semiconductor body, e.g. an insulating body
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
合肥鑫晟光电科技有限公司 HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国安徽省合肥市 新站区工业园 Xinzhan Industrial Park Hefei, Anhui 230012, CN
Inventors:
木素真 MU, Suzhen; CN
Agent:
北京银龙知识产权代理有限公司 DRAGON INTELLECTUAL PROPERTY LAW FIRM; 中国北京市 海淀区西直门北大街32号院枫蓝国际中心2号楼10层 10F, Bldg. 2, Maples International Center No. 32 Xizhimen North Street, Haidian District Beijing 100082, CN
Priority Data:
201610129930.607.03.2016CN
Title (EN) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
(FR) SUBSTRAT MATRICIEL ET SON PROCÉDÉ DE FABRICATION, ET DISPOSITIF D'AFFICHAGE
(ZH) 阵列基板及其制作方法以及显示装置
Abstract:
(EN) An array substrate (1) and a manufacturing method therefor, and a display device, the array substrate (1) comprising: a base, and a common electrode wiring pattern and a connection portion pattern provided on the base; the common electrode wiring pattern being provided on the same layer as a data line pattern, and including multiple sets of common electrode wirings CL1 arranged in a row; each set of the common electrode wirings CL1 being arranged in a row between two adjacent rows of pixels and being connected by means of a connection portion L in the connection portion pattern; each common electrode wiring CL1 arranged in a row therein being located in an idle area between two adjacent columns of data lines, the idle area being aligned in a column with each thin film transistor. Further provided are a manufacturing method for the array substrate (1) and a display device comprising the array substrate (1). The array substrate (1) can reduce the area of non-opening regions, thereby improving the opening ratio of pixels.
(FR) La présente invention concerne un substrat matriciel (1) et un procédé pour sa fabrication, ainsi qu'un dispositif d'affichage, le substrat matriciel (1) comprenant : une base, et un schéma de câblage à électrode commune et un schéma de partie de connexion prévus sur la base ; le schéma de câblage à électrode commune étant prévu sur la même couche que le schéma de ligne de données, et comprenant plusieurs ensembles de câblage CL1 d'électrode commune disposés dans une rangée ; chaque ensemble de câblage d'électrode commune CL1 étant disposé dans une rangée entre deux rangées adjacentes de pixels et étant connecté au moyen d'une partie de connexion L dans le schéma de partie de connexion ; chaque câblage à électrode commune CL1 disposé dans une rangée étant situé dans une zone libre entre deux colonnes adjacentes de lignes de données, la zone libre étant alignée dans une colonne avec chaque transistor à film mince. La présente invention concerne également un procédé de fabrication du substrat matriciel (1) et un dispositif d'affichage comprenant le substrat matriciel (1). Le substrat matriciel (1) peut réduire la surface de régions sans ouverture, améliorant ainsi le rapport d'ouverture du pixel.
(ZH) 一种阵列基板(1)及其制作方法、显示装置,该阵列基板(1)包括:基底以及设置在该基底上的公共电极走线图形和连接部图形;该公共电极走线图形与数据线图形同层设置,包含多组行方向公共电极走线CL1;每一组行方向公共电极走线CL1设置在相邻两行的像素之间并通过连接部图形中的连接部L相连;其中的每一条行方向公共电极走线CL1位于相邻两列数据线之间的闲置区域,该闲置区域在列方向上与各个薄膜晶体管对齐。还提供了该阵列基板(1)的制作方法以及包括该阵列基板(1)的显示装置。该阵列基板(1)能够减少非开口区域的面积,从而提高像素的开口率。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)