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1. (WO2017152503) WET ETCHING APPARATUS AND WET ETCHING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/152503 International Application No.: PCT/CN2016/083270
Publication Date: 14.09.2017 International Filing Date: 25.05.2016
IPC:
C23F 1/46 (2006.01) ,C23F 1/08 (2006.01)
[IPC code unknown for C23F 1/46][IPC code unknown for C23F 1/08]
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No. 10 Jiuxianqiao Road Chaoyang District Beijing 100015, CN
Inventors:
薛大鹏 XUE, Dapeng; CN
Agent:
中国专利代理(香港)有限公司 CHINA PATENT AGENT (H.K.) LTD.; 中国香港特别行政区 湾仔港湾道23号鹰君中心22号楼 22/F, Great Eagle Centre 23 Harbour Road, Wanchai Hong Kong, CN
Priority Data:
201610128624.007.03.2016CN
Title (EN) WET ETCHING APPARATUS AND WET ETCHING METHOD
(FR) APPAREIL DE GRAVURE HUMIDE ET PROCÉDÉ DE GRAVURE HUMIDE
(ZH) 湿法刻蚀设备及湿法刻蚀方法
Abstract:
(EN) A wet etching apparatus, comprising a metal ion concentration adjustment device (100, 10), used for adjusting the concentration of the metal ions in an etching liquid; and a spraying device (200, 1), the spraying device (200, 1) being connected to the metal ion concentration adjustment device (100, 10), and the spraying device (200, 1) being used for spraying the etching liquid. Further disclosed is a wet etching method.
(FR) L'invention concerne un appareil de gravure humide, comprenant un dispositif d'ajustement de la concentration en ions métalliques (100, 10), servant à ajuster la concentration en ions métalliques dans un liquide de gravure ; et un dispositif de pulvérisation (200, 1), le dispositif de pulvérisation (200, 1) étant relié au dispositif d'ajustement de la concentration en ions métalliques (100, 10), et le dispositif de pulvérisation (200, 1) servant à pulvériser le liquide de gravure. L’invention concerne en outre un procédé de gravure humide.
(ZH) 一种湿法刻蚀设备,包括:金属离子浓度调节装置(100,10),用于调节刻蚀液中金属离子的浓度;喷淋装置(200,1),喷淋装置(200,1)与金属离子浓度调节装置(100,10)相连,喷淋装置(200,1)用于喷洒刻蚀液。还公开了一种湿法刻蚀方法。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)